Elementary Reactions of Hyperthermal Gas-Phase Oxygen Atoms with Atomic Adsorbates on Si(100)-(2x1): Mechanisms and Kinetics

本提案的目的是确定控制高温气相氧原子与吸附在单晶硅上的原子的非热反应的基本机制和动力学。一种新型的超热原子氧光束源将被用来刺激在吸附改性硅表面的反应。在原子吸附反应过程中，解吸反应产物将采用质谱法进行监测。利用热解吸、x射线光电子能谱和俄歇能谱对吸附在表面的反应产物和表面的化学变化进行了研究。利用这些技术研究了超热气相氧原子与吸附的氧、氮、碳和氘原子的反应，以确定层结构和键能对反应的基本机理、动力学和选择性的影响。该项目的结果将促进目前对基本原子吸附反应的理解。教育部分是研究生和本科生的指导。研究生将在对多相化学感兴趣的行业，特别是在半导体行业的一个领域进行培训。这项工作的结果可能会对我们对半导体工业过程的理解产生重大影响，包括等离子体加工。

The objective of this proposal is to determine the elementary mechanisms and kinetics governing the non-thermal reactions of hyperthermal, gas-phase oxygen atoms with atoms adsorbed on single crystal silicon. A novel beam source of hyperthermal atomic oxygen will be used to stimulate reactions at the adsorbate-modified silicon surface. The desorbing reaction products will be monitored during the atom-adsorbate reactions using mass spectrometry. The reaction products that remain adsorbed on the surface and the chemical changes of the surface will be studied using thermal desorption, x-ray photoelectron and Auger electron spectroscopy. The reactions of hyperthermal, gas-phase oxygen atoms with adsorbed oxygen, nitrogen, carbon, and deuterium atoms will be investigated with these techniques to determine the influence of adlayer structure and bonding energetics on the elementary mechanisms, kinetics, and selectivity of the reactions. Results of this project will advance the current understanding of elementary atom-adsorbate reactions. The educational component is the mentoring of graduate and undergraduate students. Graduate students will be trained in an area that will be of significant interest to industries interested in heterogeneous chemistry, especially in the semiconductor industry. The results of this work could have a significant impact on our understanding of processes in the semiconductor industry, including plasma processing.