SBIR Phase I: Removal Of Halogenated Compounds By Microwave-Induced Non-Thermal Plasma
SBIR Phase I: Removal Of Halogenated Compounds By Microwave-Induced Non-Thermal Plasma
批准号:
0232387
负责人:
Czeslaw Golkowski
金额:
$10.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2003
资助国家:
美国
项目状态:
已结题
起止时间:
2003-01-01 至 2003-09-30
中文摘要
这个小型企业创新研究第一阶段项目将帮助开发一种创新方法,利用微波放电产生的非热等离子体有效和低成本地销毁和移除有害空气污染物(HAP),特别是卤化挥发性有机化合物(HOC)。在该方案中描述的非热技术中,充分利用了等离子体的非平衡特性。这些等离子体可以产生高能电子(典型能量为1-10 eV),从而有效地导致自由基的产生,而不需要增加与非常高的气体温度相关的热。因此,从化学的角度来看,通常与10,000-10,000 K的温度相关的破坏反应速率可以在接近环境温度的情况下实现。所提出的技术利用背景气体的解离和电离产生自由基,进而破坏和分解有毒和危险的化合物。该系统的输入能量主要用于产生所需密度的自由基,这些自由基优先与废气中通常以非常小的浓度存在的HVOCs反应。拟议的技术将满足半导体行业和其他HVOC来源对从烟气中去除有害化合物的简单和成本效益方法的日益增长的需求。新的方法很可能会成功,因为它很简单,而且气体净化装置可以很容易地改造成现有的燃烧系统。
英文摘要
This Small Business Innovation Research Phase I project will assist in the development of an innovative method for effective and low cost destruction and removal of hazardous air pollutants (HAPs), specifically Halogenated Volatile Organic Compounds (HVOCs), using non-thermal plasma generated in microwave discharges. In the non-thermal technique described in this proposal, the non-equilibrium properties of the plasma are fully exploited. These plasmas can produce energetic electrons (typical energies of 1-10 eV), which effectively lead to the creation of free radicals without the necessity of adding the enthalpy associated with very high gas temperatures. Therefore, from the chemical point of view, destruction reaction rates normally associated with temperatures of 10,000 to 100,000 K can be realized with the gas near ambient temperature. The proposed technique utilizes the dissociation and ionization of the background gases to produce radicals that, in turn, destroy and decompose the toxic and hazardous compounds. The input energy of the system is directed mostly to the production of the desired density of radicals which react preferentially with the HVOCs that are often present in very small concentrations in the exhaust gas. The proposed technology will meet a growing need in the semiconductor industry, and other HVOC sources for a simple and cost-effective method for the removal of hazardous compounds from the flue gas. The new method is likely to be successful due to its simplicity and the ease with which the gas-cleanup unit can be retrofitted to the existing combustion systems.
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会议论文
SBIR Phase II: Room Temperature Medical Waste Treatment
-
批准号:0750056
-
项目类别:Standard Grant
-
资助金额:$0.0万
-
财政年份:2008
-
负责人:Czeslaw Golkowski
-
依托单位:
SBIR Phase I: Room Temperature Medical Waste Treatment
-
批准号:0610808
-
项目类别:Standard Grant
-
资助金额:$10.0万
-
财政年份:2006
-
负责人:Czeslaw Golkowski
-
依托单位:
SBIR Phase I: Microwave-Induced Non-Thermal Plasma for Volatile Organic Compound Emission Control
-
批准号:9960175
-
项目类别:Standard Grant
-
资助金额:$10.0万
-
财政年份:2000
-
负责人:Czeslaw Golkowski
-
依托单位:
国内基金
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