GOALI: Chemical Factors Affecting Lifetime and Delivery of Metal-Organic Chemical Vapor Deposition Precursors: Exploring Gas and Liquid Phase Oligomerization, Decomposition, and Co

内布拉斯加大学化学系的John A.Belot教授提交了一份新的研究计划，旨在探索和确定影响金属氧化物薄膜挥发性MOCVD和ALD前体的寿命和传输特性的齐聚、分解和污染问题。这项提案涉及内布拉斯加州大学林肯分校和液化空气公司之间的合作。最终，PI的研究将试图通过引入痕量稳定剂来排除有害的反应性。前驱体稳定性是影响可制造性的关键因素，对半导体制造商决定采用前驱体生长金属氧化物薄膜具有决定性作用。PI将研究微量的无机化学，包括微量的水解、陈化和在选定的钛、氦和镧系均一氨基和醇盐中的浓缩，目的是改善可制造性，从而采用稳定的前驱体来沉积氧化物薄膜。本科生和研究生将在无机材料化学的前沿研究项目中接触到现实世界的问题和实习机会。

Professor John A. Belot of the University of Nebraska Chemistry Department has submitted a new GOALI proposal for research aimed at exploring and determining oligomerization, decomposition, and contamination issues affecting the lifetime and delivery characteristics of volatile MOCVD and ALD precursors for metal oxide thin films. This proposal involves collaboration between the University of Nebraska - Lincoln and Air Liquide. Ultimately, the PI's research will attempt to preclude deleterious reactivity by introducing trace stabilizing additives. Precursor stability is a critical factor which impacts manufacturability and is decisive in determining adoption of precursors for thin film growth of metal oxides by semiconductor manufacturers. The PI will study the inorganic chemistry of trace hydrolysis, aging, and concentration in select titanium, hafnium, and lanthanide homoleptic amino- and alkoxides, with the aim of improving the manufacturability and therefore the adoption of stable precursors for the deposition of oxide thin films. Undergraduate and graduate students will be exposed to real world problems and internship opportunities in a forefront research program in inorganic materials chemistry.