GOALI: Computing Tip-Specimen Shape Interaction for Accurate, High Throughput Nano-Imaging of General Three-Dimensional Structures by Atomic Force Microscopy

本奖项的研究目标是为一类新兴的扫描探针显微镜（SPM）仪器开发尖端-试样形状相互作用建模的理论和算法。由此产生的方法将支持在纳米甚至原子尺度上对具有垂直侧壁和凹边特征的一般3D结构进行成像。这种显微镜产生的当前图像是试样的畸变表示，由于有限尺寸的尖端产生的膨胀。为了消除图像畸变，必须对尖端-试样形状相互作用进行建模，以了解尖端形状、试样表面和所得SPM图像之间的关系。本研究使用三坐标表示尖端和试样的形状。基于三维数学形态学的原理方法及其在图形硬件上的有效实现将用于快速SPM成像模拟，精确的表面重建和鲁棒尖端估计。实验验证将从最先进的半导体和数据存储设备中提取样本。如果成功，本研究结果将为理解和纠正一般三维纳米结构的SPM成像中潜在的尺寸偏差提供一种手段。这将为这些结构的纳米成像带来高精度和高通量的三维重建。与Veeco和NIST的合作为在工业环境中常见的高度可重入和形态复杂的纳米结构上测试这些方法提供了充分的机会。它可以对使用SPM的整个行业产生积极影响，例如半导体、数据存储、MEMS和分子成像行业。因此，它将为纳米级制造提供计量基础。通过其综合研究、教育和推广活动，该项目将为从高中到研究生院的学生提供数学形态学和纳米成像的先进知识，并将提高国内学生对科学和工程的兴趣，从而增强在全球劳动力中的竞争力。

0800912PI: QianThe research objective of this award is to develop theories and algorithms for tip-specimen shape interaction modeling for an emerging class of scanning probe microscopy (SPM) instruments. The resulting methods will support imaging general 3D structures with vertical sidewalls and undercut features at the nanometer or even atomic scale. The current image produced by such a microscope is a distorted representation of the specimen due to the dilation produced by the finite size of the tip. The tip-specimen shape interaction must be modeled to understand the relationship among tip shape, specimen surface, and the resulting SPM image in order to remove the distortion of the image. This research uses a tri-dexel for tip and specimen shape representation. Principled methods based on 3D mathematical morphology and their efficient implementation on graphics hardware will be developed for fast SPM imaging simulation, accurate surface reconstruction, and robust tip estimation. Experimental validation will draw specimens from state-of-the-art semiconductor and data storage devices. If successful, the results of this research will provide a means to understand and correct potential dimensional bias in SPM imaging of general 3D nanostructures. It will lead to high accuracy and high throughput 3D reconstruction in nano-imaging of these structures. The collaboration with Veeco and NIST provide ample opportunity to testbed these methods on highly reentrant and morphologically complex nanostructures typically found in industrial settings. It can positively impact the entire spectrum of industries that use SPM such as semiconductor, data storage, MEMS, and molecular imaging industries. It will thus provide a metrological basis for nanoscale manufacturing. Through its integrated research, education and outreach activities, this project will provide advanced knowledge in mathematical morphology and nano-imaging for students from high school to graduate school and will increase domestic students' interest in science and engineering resulting in strengthened competitiveness in the global workforce.