Fabrication of nano - structure using highly charged ions

高电荷态离子在各种材料表面产生纳米级的结构修饰。高电荷态离子有望成为制备纳米结构和纳米器件的有力工具。在本研究项目中，为利用高电荷态离子生产纳米器件的可能设施进行了各种技术开发。本项目中进行的研究课题如下：1.开发束流传输系统，将在电子束离子陷阱(东京EBIT)中产生的高电荷态离子传输到与电子束传输相连接的辐射室。利用线探针技术开发了新型的种子离子注入EBIT系统。高电荷态离子辐照表面二次电子数分布测量系统的研制

Highly charged ion produces structural modification in nm scale on the surface of various materials. Highly charged ions are expected to become a powerful tool for the fabrication of nano-structure and nano-devices. In the present research project, various technical development were performed for the possible production facility of nano-devices using highly charged ions.The research subjects performed in the present project are as follows ;1. Development of beam transport system which transfer highly charged ions produced at the electron beam ion trap (Tokyo EBIT) to an irradiation chamber connected to the beam transport.2. Development of new feeding system of seed ions into the EBIT using wire probe technique.3. Development of a measurement system of the number distribution of secondary electrons emitted from the surface irradiated by highly charged ions.