Confocal DC/RF Magnetron-Sputter-System

共焦溅射是一种物理气相沉积(PVD)工艺，它允许通过使用多个共焦布置的溅射源的阴极溅射来沉积功能异质结构。共焦溅射与经典溅射的不同之处在于多个溅射源同时工作。在这项提议的范围内，要求采购具有共焦排列阴极的DC/RF溅射系统，以实施创新的研究项目。微纳电子学教席的研究重点是新型半导体和功能薄膜以及低维材料，这些材料在新型电子设备、信息技术、传感器技术和微纳系统中得到应用。共溅射系统将是开展从基础科学到应用科学的创新研究项目所需技术的组成部分。与传统的溅射工艺不同，共溅射不仅允许连续沉积不同的材料层，而且允许连续变化的层组成，具有很高的灵活性。与惰性气体相结合，使用氧气或氮气等反应气体提供了沉积薄层氧化物和/或氮化物的可能性。这种工艺参数的组合为创新和功能薄膜的沉积开辟了全新的可能性。在面向未来的研究计划的背景下，将实现基于过渡金属氧化物的具有可调化学计量比和缺陷密度的异质结构。这种材料体系在新型纳米结构传感器、热释电材料和等离子体材料领域得到了应用。此外，共溅射可以制备具有复杂掺杂分布和原位可控掺杂浓度的薄膜，这是经典的掺杂方法所不能实现的。通过这种方式，纳米离子工艺可以应用于神经形态学领域的高度集成的忆阻器。在这项提议的范围内，多特蒙德理工学院电气工程和信息技术系以及物理系的其他用户也将开展研究项目，今后也将在鲁尔研究联盟内开展。通过这种方式，沉积系统将成为优秀的跨学院项目的关键工具，并为中期内进一步的跨学科协同作用奠定基础。

Confocal sputtering (co-sputtering) is a physical vapor deposition (PVD) processes, which allows for deposition of functional heterostructures by means of cathode sputtering using multiple confocally arranged sputter sources. Confocal sputtering differs from classical sputtering in that several sputter sources are operated in simultaneously. Within the scope of this proposal, the procurement of a DC/RF sputtering system with confocally arranged cathodes is requested for the implementation of innovative research projects. Research of the Chair of Micro- and Nanoelectronics is focused on novel semiconducting and functional thin-films and low-dimensional materials, which find application in novel electronic devices, information technology, sensor technology and micro- and nanosystems. The co-sputter system will be an integral part of the technology required to carry out innovative research projects ranging from fundamental to applied science. Unlike conventional sputtering processes, co-sputtering allows not only the sequential deposition of different material layers but also a continuous change of the layer composition with high flexibility. In combination with inert gases, the use of reactive gases such as oxygen or nitrogen offers the possibility of depositing thin layers of oxides and/or nitrides. This combination of process parameters opens up completely new possibilities in the deposition of innovative and functional thin-films. Within the context of future-oriented research projects, heterostructures based on transition metal oxides with tunable stoichiometry and defect density are to be realized. Such material systems find application in the field of novel nanostructured sensors, thermo- and pyroelectrics as well as plasmonics. Furthermore, co-sputtering allows the fabrication of thin-films with complex dopant profiles and in situ controllable dopant concentration, which cannot be realized by classical doping methods. In this way, nanoionic processes can be used in highly integrated memristors for applications in the field of neuromorphics. Within the scope of this proposal, research projects will also be carried out by other users from the departments of electrical engineering and information technology as well as physics within the TU Dortmund and in the future also within the Research Alliance Ruhr. In this way, the deposition system will be a key tool for excellent cross-faculty projects and forms the basis for further interdisciplinary synergies in the medium term.