Developement of thermal neutron beam with high luminocity

我们利用溅射装置来制备具有高度取向性的金属薄膜。该溅射机有两个阴极，一个用于非磁性金属靶，另一个用于铁磁性金属靶，由于阴极真空问题，我们在溅射机安装后13个月就开始了薄膜的制作。Cu的溅射膜没有显示出任何取向。然而，通过安装的机器获得的Cr膜表现出高的取向度，角度发散度在0.2度以内。对衬底对薄膜取向的影响进行了系统的研究，并即将发表。用溅射机制备的这种高度取向的薄膜，证明了用取向金属膜组装新型中子单色器的可能性。

We installed a squttering instrument to fabricate thin metallic films with highly orientation. This squttering machine has two cathodes, one is for the non-magnetic metallic target and the other one is for ferromagnetic metallic traget.Due to the trouble in vacuum of cathode we have started the fabrication of films 13 months after the installation of the sputtering machine. The sputtered films of Cu did not show any orientation. However, the Cr films obtained by the installed machine exhibited a high orientation with the angle divergence within 0.2 degrees. The systematic study on the effect of substrate on the orientation of films was performed and will be published. Such a highly oriented films produced by the sputtering machine proved a possibility of new type of neutron monochromater by assembling oriented metalic films.