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Influence of Alloying Elements on the oxidation Characteristics of Ti-Al Intermetallic Compounds

Influence of Alloying Elements on the oxidation Characteristics of Ti-Al Intermetallic Compounds
合金元素对Ti-Al金属间化合物氧化特性的影响
批准号:
07650845
负责人:
TANIGUCHI Shigeji
金额:
$1.34万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996

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中文摘要
翻译
含Hf高达5.2%的TiAl试样进行等温氧化,在1100至1400 K的温度范围内,在大气压下的纯氧流。在1200和1300 K下,添加0.2%Hf对降低氧化速率非常有效。用常规方法进行金相检验,发现添加Hf后,最初形成的Al_2O_3氧化膜保持得很好。然而,Hf的进一步添加导致在1200 K下的氧化的轻微增强和在1300 K下的效果的逐渐减小。在1300 K下添加5.2%Hf几乎没有效果。添加0.2%Zr与添加0.2%Hf类似地有效。这些添加剂还改善了在室温和1300 K之间变化的温度下至少100个循环(360 ks)的循环氧化的抗性。然而,这两种添加剂的效果变得很小,在1350 K和1400 K时,它是相反的。Ti_3Al和Ti_3Al-21%Nb试样在1100 ~ 1300 K的温度范围内,于常压下,在纯O_2、Ar-21%O_2或N_2-21%O_2气流中进行等温氧化。氧化气氛中的N_2使Ti_3Al的氧化速率略有降低。这是由于TiN的形成导致铝在试样表面附近富集。在氧化膜/Ti_3Al-21 Nb基体附近形成了一层薄的TiN层,导致TiN层下Al_2O_3的富集,从而大大降低了氧化速率。
英文摘要
TiAl coupon specimens containing Hf of up to 5.2% were isothermally oxidised in a temperature range 1100 to 1400 K in a flow of purified oxygen under atmospheric pressure. The addition of 0.2% Hf is very effective to decrease the oxidation rate at 1200 and 1300 K.Metallographic examinations using the conventional methods revealed that the initially formed Al_2O_3 scale is maintained very sound by the addition. However, further additions of Hf result in a slight enhancement of oxidation at 1200 K and a gradual decrease of the effect at 1300 K.There is almost no effect by the addition of 5.2% Hf at 1300 K.The addition of 0.2% Zr is similarly effective as the addition of 0.2% Hf. These additives also improve the resistance to cyclic oxidation with temperature varying between room temperature and 1300 K for at least 100 cycle (360 ks). However, the effect of the both additives becomes small at 1350 K and at 1400 K it is inverted. Ti_3Al and Ti_3Al-21%Nb coupon specimens were isothermally oxidised in a temperature range 1100 to 1300 K in a flow of purified O_2, Ar-21%O_2 or N_2-21%O_2 under atmospheric pressure. The N_2 in the oxidation atmosphere decreases the oxidation rate of Ti_3Al a little. This is attributable to the formation of TiN resulting in the enrichment of Al near the specimen surface. A thin TiN layr is formed near the scale/Ti_3Al-21Nb substrate, leading to the enrichment of Al_2O_3 beneath the TiN layr and thus to a considerable decrease in the oxidation rate.
期刊论文(19)
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S. Taniguchi, T.Shibata, S. Sakon: "Oxidation Resistance of TiAl Significantly Improved by Combination of Preoxidation and Hf Aaddition." Mater. Sci. Eng.A198・1. 85-90 (1995)
S. Taniguchi、T. Shibata、S. Sakon:“通过预氧化和添加 Hf 的组合显着提高了 TiAl 的抗氧化性”,Mater.A198·1。
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通讯作者:
S.Taniguchi, H.Juso, T.Shibata: "Improvement in High-Temperature Oxidation Resistance of TiAl by Addition of 0.2 mass% Z r" Mater.Trans.JIM. 37-3. 245-250 (1996)
S.Taniguchi,%20H.Juso,%20T.Shibata:%20"改进%20in%20高温%20氧化%20电阻%20of%20TiAl%20by%20添加%20of%200.2%20mass%%20Z%20r"%20Mater
DOI: --
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通讯作者:
S.Taniguchi,T.Shibata,S.Sakon: "Oxidation Resistance of TiAl Significantly Improved by Combination of Preoxidation and Hf Aaddition." Mater.Sci.Eng.A198・1. 85-90 (1995)
S.Taniguchi、T.Shibata、S.Sakon:“通过预氧化和添加 Hf 的组合显着提高了 TiAl 的抗氧化性。Mater.Sci.Eng.A198・1”(1995 年)。
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通讯作者:
S. Taniguchi, T.Shibata, T. Saeki: "Effect of Nb-Ion Implantation on the Oxidation Resistance of TiAl." Mater. Trans. JIM. 37・5. 998-1003 (1996)
S. Taniguchi、T. Shibata、T. Saeki:“Nb 离子注入对 TiAl 抗氧化性的影响”,JIM 37・5。
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共 19 条
    Oxidation Resistance and Strength of TiAl Based Alloys in a Simulated
    • 批准号:
      12450295
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $8.96万
    • 财政年份:
      2000
    • 负责人:
      TANIGUCHI Shigeji
    • 依托单位:
    Study on Improvement in the Oxidation Resistance of TiAl at High Temparatarcs low Ion Implantation
    • 批准号:
      09650785
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.5万
    • 财政年份:
      1997
    • 负责人:
      TANIGUCHI Shigeji
    • 依托单位:
    Studies on the Improvement of High-Temperature Corrosion Resistance of Ni_3Al Base Alloys
    • 批准号:
      01550552
    • 项目类别:
      Grant-in-Aid for General Scientific Research (C)
    • 资助金额:
      $1.34万
    • 财政年份:
      1989
    • 负责人:
      TANIGUCHI Shigeji
    • 依托单位:
    海外基金