Photo functional metal oxide porous films with enhanced performance and a low cost film fabrication

二氧化钛应用于光催化剂和染料敏化太阳能电池（DSSCs）。提出了一种含硝酸钛的液相二氧化钛薄膜涂层新工艺。主要研究了二氧化钛薄膜在DSSCs中的应用。为了获得最佳的电池性能，有必要优化二氧化钛等光敏材料与透明导电氧化物（TCO）之间的界面。本文采用掺氟二氧化锡（FTO）薄膜作为TCO薄膜。利用不同择优取向的多晶FTO薄膜，讨论了界面的许多问题。在这些FTO薄膜上制备了致密的二氧化钛薄膜，并用SIMS分析分析了界面中氟和氯的浓度分布。在AM1.5和100mW/cm2条件下对具有这些接口的DSSCs的性能进行了估计。在界面分析的基础上，发现FTO薄膜需要在间隙位置没有多余的氯和极优选的晶体取向。此外，在高表面粗糙度的纹理玻璃衬底上制备了FTO薄膜，并制备了具有FTO中间层的串联型电池，以提高电池性能。发现液相沉积是使致密二氧化钛薄膜适应高粗糙度表面的有效方法之一。由于致密膜的沉积，DSSCs的泄漏电流被抑制。液相沉积是一种非常有用的技术。

Titanium dioxide was applied for photocatalyst and dye sensitized solar cells (DSSCs). A new coating technique of titanium dioxide thin films was developed in a liquid phase included titanyl nitrate. Applications of the titanium dioxide thin films are mainly studied for DSSCs. In order to lead to best cell performance, it is necessary to optimize the interface between photo sensitive materials such as titanium dioxide and transparent conductive oxides (TCO). In this report, fluorine doped tin dioxide(FTO)films were employed as the TCO films. Many problems of the interface were discussed by using polycrystalline FTO films with different preferred crystalline orientations. The compact titanium dioxide films were prepared on these FTO films, and profiles of fluorine and chlorine concentration in the interface were elucidated by SIMS analyses. The performance of DSSCs with these interfaces was estimated on AM1.5 and 100mW/cm2. On the basis of the interface analyses, it was found that the FTO films needed to be free of excess chlorine of interstitial sites and extremely preferred crystalline orientations. Moreover, FTO films on texture glass substrates with high surface roughness and tandem type cells with FTO middle layer were fabricated for enhanced cell performance. It was found that the liquid phase deposition was one of useful methods to fit the compact titanium dioxide films to the higher roughness surfaces. The leaked currents of the DSSCs were depressed as a result of the deposition of the compact films. The liquid phase deposition is very useful technique.