Fundamental studies of the mechanism of atmospheric pressure plasma deposition of thin films

该项目将在过去12个月开发的技术平台的基础上，扩展对革命性等离子体沉积过程--大气压等离子体沉积过程中发生的机理的基本理解。沉积过程使用含有沉积源材料的液体来限制等离子体。目前，该工艺在耐磨涂层、生物材料和电子产品方面的巨大商业潜力受到对沉积基本机理和控制该工艺的关键等离子体参数了解不足的限制。这个基础科学项目专注于基础化学和等离子体过程，并将开发初始模型，使该过程得以推广。

This project will extend fundamental understanding of the mechanisms occurring in a revolutionary plasma deposition process, atmospheric pressure plasma deposition, building upon a platform of technology developed over the last 12 months. The deposition process uses liquid containing the deposition source materials to confine the plasma. The enormous commercial potential of the process for wear-resistant coatings, biomaterials and electronics is currently limited by insufficient understanding of the basic mechanisms of deposition, and critical plasma parameters which control the process. This basic science project focusses on fundamental chemical and plasma processes, and will develop initial models, enabling generalisation of the process.