Adjustment for application of ion beam and material excitation

目的是对姬路工业大学两台200 keV Cockcroft-Walton型加速器的轻重离子束输运系统进行改进和调整，并对金属离子进行加速。对束流传输系统进行了改进，使束流的大小和形状可以自由控制，并能获得稳定的束流。用稳定束流对不同样品进行了轻离子注入实验，并发表了实验结果。提取的负金属离子在加速的中途用Argongas电荷剥离器转化为正离子。由于金属离子源和加速器的改进，使两台加速器同时加速不同种类离子注入成为可能，其中一个问题是电荷集中效率。通过氩气电荷剥离器提高电荷转换效率，有望使该系统得到更广泛的应用。目前正在进行更多的改进。

The aim is an improvement and adjustment of the transport system of light and heavy ion beams from two 200 keV Cockcroft-Walton type accelerator devices at Himeji Institute of Technology and accerelation of metal ion. The beam transport system was improved to control the size and shape freely, and to able to obtain stable beam. The light ion implantation experiments in various specimens were made using stable beam and the results were published.One of two accelerators was improved to accelerate a metal ion(Ni-ion] with a tandem acceleration method. The extracted negative metal ions are converted to positive ions on the half way in acceleration with a Argongas charge stripper. The simultaneous implantation of different ion species accelerated by two accelerators became to be possible owing to the improvement of a metal ion source and the acceleration.One of the problems is an efficiency of charge concersion. Various and wide application tof this system is expected by improvement of the charge conversion efficiency with Argon gas charge stripper. More improvemnet is in progress at present.