Radioisotope-powered Parallel Electron Lithography for High-throughput Nano-manufacturing

本项目旨在实现大面积、高通量、低成本的可控纳米器件的快速制造。缺乏大尺寸（大于4英寸）掩膜和超低剂量抗蚀剂是高通量放射性同位素驱动的平行电子纳米光刻（RIPEL）系统面临的根本挑战。该项目旨在通过使用具有最先进的杨氏模量与立方密度之比值的超轻支撑材料aerographite来实现大尺寸的RIPEL掩膜。开发新型超低剂量无机纳米颗粒抗蚀剂。这些构建模块将使RIPEL的吞吐量提高四个数量级。该项目将有助于使处理器或固态存储器更便宜、更高效。

This project aims to realise rapid fabrication of controllable nano-devices over large areas with high throughput and low cost. The lack of large-size (greater than four inch) mask and ultra-low dose resist are the fundamental challenges for high-throughput radioisotope-powered parallel electron nano-lithography (RIPEL) systems. This project aims to realise a large-size RIPEL mask by using the ultra-light supporting material aerographite that has a state-of-the-art ratio value of Young's modulus to cubic density. It will also develop a new inorganic nanoparticle resist with ultra-low dose. These building blocks will enhance RIPEL's throughput by four orders of magnitude. The project will contribute to making processors or solid state storage cheaper and more efficient.