Aerosol-assisted chemical vapour deposition of MOF thin films

气溶胶辅助化学气相沉积（AACVD）是一种可扩展的常用方法，用于制备各种无机材料的薄膜。另一方面，通过金属离子和有机连接剂的自组装形成的高表面积结晶微孔金属有机框架（MOF）的许多应用也需要薄膜构造。然而，用于产生MOF薄膜的当前方法（例如逐层沉积）通常是劳动密集型的或需要长的反应时间，并且通常不能扩展以覆盖大面积基底。AACVD提供了一个令人兴奋的替代方案，该项目将系统地研究AACVD方法在不同基底上生成一系列MOF薄膜的潜力，并随后研究其能量相关和光化学应用和/或抗菌性能。

Aerosol assisted chemical vapour deposition (AACVD) is a scalable and commonly used method for making thin films of diverse inorganic materials. On the other hand, many applications of high surface area crystalline microporous metal organic frameworks (MOFs) formed by the self-assembly of metal-ions and organic linkers also require a thin film configuration. Current methods for the generation of MOF thin films such as layer-by-layer deposition however, are often labour intensive or require long reaction times and are not generally scalable to cover large area substrates. AACVD offers an exciting alternative, and this project will systematically investigate the potential of AACVD methods to generate a range of MOF thin films onto diverse substrates and a subsequent investigation of their energy-related and photochemical applications and/or antimicrobial properties.