Particle Impact Deposition for the Manufacture of Next Generation Electroceramics
Particle Impact Deposition for the Manufacture of Next Generation Electroceramics
批准号:
2437836
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
英国
项目类别:
Studentship
财政年份:
2020
资助国家:
英国
项目状态:
已结题
起止时间:
2020 至 --
中文摘要
粒子碰撞沉积(AD)是一种新型的固相沉积技术,它利用超音速气体射流将细小的颗粒加速到高速,然后冲击到衬底上,形成薄的功能晶片/薄膜。撞击速度需要超过取决于材料和工艺的临界速度,才能使颗粒变形并将其附着在衬底上。所制备的薄膜在微致动器和传感器、热电发电机、超导体、燃料电池、电池和磁性材料的部件中有应用。与传统的热喷涂技术相比,该技术具有优势,例如,氧/温度敏感材料沉积的稳定性。然而,撞击和保持的效率很低,获得理想的薄膜性能的条件还没有得到很好的了解,限制了该技术的发展。在这个项目中,计划对微米级颗粒的撞击动力学进行建模和实验相结合的工作。目的是通过颗粒碰撞和变形的模拟和实验工作的验证,更好地了解沉积过程中颗粒碰撞和薄膜形成的机理。项目成果将有助于确定、控制和修改对沉积过程的效率和所生产的胶片质量产生不利影响的因素(材料和/或工艺相关)。这有助于后两者的增强,进而可以导致该技术在工业上更广泛的使用。
英文摘要
Particle impact deposition (AD) is a new solid-state coating technique by which fine particles are accelerated to high velocities by a supersonic gas jet and impacted onto a substrate to build up a thin functional wafer/film. The impact velocity needs to exceed a material- and process-dependent critical velocity to deform particles and adhere them to the substrate. The produced film has applications in micro-actuators and components in sensors, thermoelectric generators, superconductors, fuel cells, batteries and magnetic materials. The technique offers advantages over traditional thermal spray techniques, e.g. stability for the deposition of oxygen/temperature-sensitive materials. However, the efficiency of impingement and retention is low and the conditions for attaining desirable film properties are not well-understood, limiting the development of the technique. In this project, a combined modelling and experimental work on the impact dynamics of micrometre-sized particles is planned. The aim is to obtain a better understanding of the mechanisms of particle impact and film formation during the deposition process by modelling of particle impact and deformation and experimental work for validation. The project outcome will help identify, control and modify the factors (material and/or process-related) that adversely affect the efficiency of the deposition process and quality of the produced films. This contributes to the enhancement of the latter two, which in turn can lead to the more widespread industrial use of the technique.
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