Laboratory and Synchrotron Measurements of Electromagnetic Phenomena in Nanostructured Materials

我的研究计划的目标是开发精确表征纳米材料的新方法，特别关注它们在光子学和超快电子领域的潜在应用，这些领域是最有可能受到精确控制纳米制造技术进步影响的技术领域之一。这项提议以一种独特的方式结合了基于等离子体的处理技术、同步加速器测量和精密测量，以推进纳米技术。学生培训将是这项研究计划的重要组成部分。与本提案中的科学工作相关的纳米结构测量和制造技术在研究实验室之外有许多应用，在我的研究实验室培训的学生可以获得的培训范围使他们能够在一系列技术部门找到有趣的机会。*在过去的几年里，我的研究小组一直在开发适合于纳米制造应用的基于低能离子注入的等离子体技术。我们已经使用这些技术来制造新型的发光二极管(LED)，这种发光二极管是基于镶嵌在硅基质中的硅和碳化硅纳米晶体。在硅光子学的重要领域，这种器件可能成为高带宽片上光通信的基础。我的实验室最近探索的另一种纳米制造技术(与加拿大光源的研究人员合作)是使用超低能量等离子体离子轰击演示石墨烯薄膜的低缺陷掺杂。这项技术的进一步发展将是制造基于石墨烯的超高速电子产品的重要基础。我的团队在硅纳米晶体和基于石墨烯的结构方面的工作科学工作有可能导致光子学和超快电子学的新发展，这是信息和通信技术的重要技术应用领域。

The goal of my research program is to develop new methods for characterizing nanoscale materials precisely, with a particular eye to their potential applications in photonics and ultrafast electronics, which are among the areas of technology most likely to be influenced by advances in precisely controlled nano-fabrication. This proposal combines plasma-based processing techniques, synchrotron measurements, and precision measurement in a unique way to advance nanoscale technology. Student training will be an important part of this research program. The nanostructure measurement and fabrication technologies associated with the scientific work in this proposal have many applications outside the research lab and the breadth of training available to students trained in my research lab has enabled them to find interesting opportunities across a range of technology sectors.***Over the past several years my research group has been developing plasma techniques based on low energy ion implantation which are suited for nanofabrication applications. We have used these techniques to fabricate new types of light-emitting diodes (LEDs) based on nanocrystals of silicon and silicon carbide embedded in a silicon matrix. Such devices could become the basis for high-bandwidth on-chip optical communications, in the important area of silicon photonics. Another nanofabrication technique recently explored in my lab (in collaboration with researchers at the Canadian Light Source) is the demonstration of low-defect doping of graphene films using ultra-low energy plasma ion bombardment. Further development of this technology will be important for fabrication of ultra-fast electronics based on graphene. My group's work scientific work on silicon nano-crystals and graphene-based structures has the potential to lead to new developments in photonics and ultrafast electronics, which are important areas of technological application for Information and Communications Technologies.*** ********