Extreme anti-reflection enhanced magneto-optic Kerr effect microscopy.
Extreme anti-reflection enhanced magneto-optic Kerr effect microscopy.
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DOI:
10.1038/s41467-020-19724-7
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发表时间:
2020-11-23
影响因子:
16.6
通讯作者:
Seo MK
中科院分区:
文献类型:
--
作者:
Kim D;Oh YW;Kim JU;Lee S;Baucour A;Shin J;Kim KJ;Park BG;Seo MK
Magnetic and spintronic media have offered fundamental scientific subjects and technological applications. Magneto-optic Kerr effect (MOKE) microscopy provides the most accessible platform to study the dynamics of spins, magnetic quasi-particles, and domain walls. However, in the research of nanoscale spin textures and state-of-the-art spintronic devices, optical techniques are generally restricted by the extremely weak magneto-optical activity and diffraction limit. Highly sophisticated, expensive electron microscopy and scanning probe methods thus have come to the forefront. Here, we show that extreme anti-reflection (EAR) dramatically improves the performance and functionality of MOKE microscopy. For 1-nm-thin Co film, we demonstrate a Kerr amplitude as large as 20° and magnetic domain imaging visibility of 0.47. Especially, EAR-enhanced MOKE microscopy enables real-time detection and statistical analysis of sub-wavelength magnetic domain reversals. Furthermore, we exploit enhanced magneto-optic birefringence and demonstrate analyser-free MOKE microscopy. The EAR technique is promising for optical investigations and applications of nanomagnetic systems. Magneto-optic Kerr effect microscopy is useful for dynamic magnetic studies, but is limited by the weak magneto-optical activity. Here, the authors show that extreme anti-reflection result in a Kerr amplitude as large as 20° and enables real-time detection of sub-wavelength magnetic domain reversals.
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影响因子:
16.6
作者:
Bonetti S;Kukreja R;Chen Z;Macià F;Hernàndez JM;Eklund A;Backes D;Frisch J;Katine J;Malm G;Urazhdin S;Kent AD;Stöhr J;Ohldag H;Dürr HA
通讯作者:
Dürr HA
影响因子:
35
作者:
Higo T;Man H;Gopman DB;Wu L;Koretsune T;van 't Erve OMJ;Kabanov YP;Rees D;Li Y;Suzuki MT;Patankar S;Ikhlas M;Chien CL;Arita R;Shull RD;Orenstein J;Nakatsuji S
通讯作者:
Nakatsuji S
影响因子:
38.3
作者:
Kampfrath, T.;Battiato, M.;Muenzenberg, M.
通讯作者:
Muenzenberg, M.
影响因子:
3.2
作者:
Everschor-Sitte, K.;Masell, J.;Klaeui, M.
通讯作者:
Klaeui, M.
影响因子:
2.1
作者:
AHN, KY;FAN, GJ
通讯作者:
FAN, GJ