Surface modification and deuterium retention of tungsten and tungsten-rhenium alloys exposed to deuterium plasma
Surface modification and deuterium retention of tungsten and tungsten-rhenium alloys exposed to deuterium plasma
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暴露于氘等离子体的钨和钨铼合金的表面改性和氘保留
DOI:
10.1016/j.nme.2021.101079
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发表时间:
2021-12
影响因子:
2.6
通讯作者:
Peng Wang
中科院分区:
文献类型:
--
作者:
Xuexi Zhang;Li Qiao;Hong Zhang;WeiZhi Yao;Wenhao He;YuHong Li;Peng Wang
Surface modification and deuterium (D) retention in pure tungsten (W) and tungsten-rhenium (W-Re) alloys with Re concentration of 1, 3, 5 and 10 wt.% were investigated after exposure to D plasma with an incident energy of 38 eV/D at about 400 K and various fluences ranging from 7.2 × 1023to 2.6 × 1025D/m2. It is found that blistering depends strongly on the exposure fluence for both W and W-Re alloy samples. When the D fluence is higher than 2.8 × 1024D/m2, the surface of W is covered by two types of blisters. One type is small blisters (<2 μm), which appeared in groups only on grains with surface orientation close to (1 1 1). The other type is large-sized (>8 μm) and extents over several grains. In the cases of W-Re alloys, only small blisters can be observed on their surface. The blisters on the surface of W-Re alloys preferentially appeared on grains with surface orientation close to (1 1 1). Cross-section views of blisters show that the blisters on W-Re alloys always originate from intra-granular cavities. The small and large blisters on W originate from intra- and inter-granular cavities, respectively. The surface blistering fluence threshold for W-Re alloys is lower than for W. For both types of materials, rupture of blisters occurs if the underlying crack reaches the surface at the edge of a blister. The number of ruptured blisters increases with increasing D fluence. TDS results show that there is an additional high-temperature peak at ∼ 800 K in W-Re alloys. The amount of D released from W and W-Re alloys increases with increasing D fluence. In addition, the accumulation of D in W-Re alloys is not noticeably influenced by the amount of Re doping at the exposure temperature of ∼ 400 K.
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影响因子:
3.3
作者:
M. Hoen;B. Tyburska-Pueschel;K. Ertl;M. Mayer;J. Rapp;A. Kleyn;P. Zeijlmans van Emmichoven
通讯作者:
M. Hoen;B. Tyburska-Pueschel;K. Ertl;M. Mayer;J. Rapp;A. Kleyn;P. Zeijlmans van Emmichoven
影响因子:
3.3
作者:
Xuexi Zhang;L. Qiao;Hong Zhang;Yuhong Li;Peng Wang;Chang Liu
通讯作者:
Xuexi Zhang;L. Qiao;Hong Zhang;Yuhong Li;Peng Wang;Chang Liu
影响因子:
3.1
作者:
B. Tyburska;V. Alimov;O. Ogorodnikova;Klaus Schmid;K. Ertl
通讯作者:
B. Tyburska;V. Alimov;O. Ogorodnikova;Klaus Schmid;K. Ertl
影响因子:
3.1
作者:
A. Golubeva;M. Mayer;J. Roth;V. Kurnaev;O. Ogorodnikova
通讯作者:
A. Golubeva;M. Mayer;J. Roth;V. Kurnaev;O. Ogorodnikova
影响因子:
3.1
作者:
Jing Wang;Y. Hatano;T. Hinoki;V. Alimov;A. Spitsyn;N. Bobyr;S. Kondo;T. Toyama;Heun Tae Lee;Y. Ueda;T. Schwarz-Selinger
通讯作者:
Jing Wang;Y. Hatano;T. Hinoki;V. Alimov;A. Spitsyn;N. Bobyr;S. Kondo;T. Toyama;Heun Tae Lee;Y. Ueda;T. Schwarz-Selinger