A Subtractive Photoresist Platform for Micro‐ and Macroscopic 3D Printed Structures
A Subtractive Photoresist Platform for Micro‐ and Macroscopic 3D Printed Structures
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用于微观和宏观 3D 打印结构的减色光刻胶平台
DOI：
10.1002/adfm.201801405
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发表时间：
2018
影响因子：
19
通讯作者：
C. Barner‐Kowollik
中科院分区：
文献类型：
--
作者：
Markus M Zieger;Patrick Müller;E. Blasco;C. Petit;Vincent Hahn;Lukas Michalek;H. Mutlu;M. Wegener;C. Barner‐Kowollik
结构元素的选择性移除在3D打印应用中起着决定性的作用，使复杂的几何图形成为可能。到目前为止，微米级复杂结构的制造受到多步骤工艺的严重限制。在此，报道了一种减影光刻胶平台技术，该技术可通过激光直接写入从微观3D打印转移到通过立体光刻的宏观结构。所有抗蚀剂组件都很容易接触和更换，可快速适应抗蚀剂的性能配置文件。微印刷结构和宏观印刷结构可以以容易的方式移除，而不影响基于标准光刻胶的物体。通过时间推移光学显微镜以及深入的光谱评估分析了裂解过程。采用纳米压痕技术对印刷材料的力学性能进行了研究。关键是，通过在微观尺度上构建具有飞行特征的复杂3D对象来展示减法抗蚀剂平台的能力。
The selective removal of structural elements plays a decisive role in 3D printing applications enabling complex geometries. To date, the fabrication of complex structures on the microscale is severely limited by multistep processes. Herein, a subtractive photoresist platform technology that is transferable from microscopic 3D printing via direct laser writing to macroscopic structures via stereolithography is reported. All resist components are readily accessible and exchangeable, offering fast adaptation of the resist's property profile. The micro‐ and macroprinted structures can be removed in a facile fashion, without affecting objects based on standard photoresists. The cleavage is analyzed by time‐lapse optical microscopy as well as via in‐depth spectroscopic assessment. The mechanical properties of the printed materials are investigated by nanoindentation. Critically, the power of the subtractive resist platform is demonstrated by constructing complex 3D objects with flying features on the microscale.
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影响因子：
35
作者：
Gissibl, Timo;Thiele, Simon;Giessen, Harald
通讯作者：
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