Investigations on T cell transmigration in a human skin-on-chip (SoC) model.
Investigations on T cell transmigration in a human skin-on-chip (SoC) model.
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DOI:
10.1039/d0lc01194k
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发表时间:
2021-04-20
期刊:
影响因子:
6.1
通讯作者:
Lin F
中科院分区:
文献类型:
--
作者:
Ren X;Getschman AE;Hwang S;Volkman BF;Klonisch T;Levin D;Zhao M;Santos S;Liu S;Cheng J;Lin F
A microfluidics-based three-dimensional skin-on-chip (SoC) model is developed in this study to enable quantitative studies of transendothelial and transepithelial migration of human T lymphocytes in mimicked skin inflammatory microenvironments and to test new drug candidates. The keys results include 1) CCL20-dependent T cell transmigration is significantly inhibited by an engineered CCL20 locked dimer (CCL20LD), supporting the potential immunotherapeutic use of CCL20LD for treating skin diseases such as psoriasis; 2) transepithelial migration of T cells in response to a CXCL12 gradient mimicking T cell egress from the skin is significantly reduced by a Sphingosine-1-phosphate (S1P) background, suggesting the role of S1P for T cell retention in inflamed skin tissues; and 3) T cell transmigration is induced by inflammatory cytokine stimulated epithelial cells in the SoC model. Collectively, the developed SoC model recreates a dynamic multi-cellular micro-environment that enables quantitative studies of T cell transmigration at a single cell level in response to physiological cutaneous inflammatory mediators and potential drugs. Our skin-on-chip (SoC) model uniquely enabled quantitative studies of transendothelial and transepithelial migration of human T lymphocytes under mimicked inflammatory skin conditions and was used to test new drug candidates.
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影响因子:
7.3
作者:
Brinkman CC;Peske JD;Engelhard VH
通讯作者:
Engelhard VH
影响因子:
4.6
作者:
Aoki M;Aoki H;Ramanathan R;Hait NC;Takabe K
通讯作者:
Takabe K
影响因子:
4.4
作者:
Otero, Carolina;Groettrup, Marcus;Legler, Daniel F.
通讯作者:
Legler, Daniel F.
DOI:
10.1073/pnas.1704958114
发表时间:
2017-11-21
影响因子:
11.1
作者:
Getschman, A. E.;Imai, Y.;Volkman, B. F.
通讯作者:
Volkman, B. F.
影响因子:
3.7
作者:
Nandagopal S;Wu D;Lin F
通讯作者:
Lin F