Atomistic origins of material removal rate anisotropy in mechanical polishing of diamond crystal
Atomistic origins of material removal rate anisotropy in mechanical polishing of diamond crystal
复制标题
金刚石晶体机械抛光中材料去除率各向异性的原子起源
DOI:
10.1016/j.carbon.2015.12.001
复制
发表时间:
2016-04
期刊:
影响因子:
--
通讯作者:
Zhang J J
中科院分区:
文献类型:
--
作者:
Zong W J;Cheng X;Zhang J J
In this work, molecular dynamics simulation is employed to represent the diamond polishing. Radial distribution function and coordination number analyses are further performed to reveal the underlying atomistic origins of the removal rate anisotropy. The results show that the lattice distortion is inevitable as the diamond substrate suffers from the mechanically induced effects, which produces an amorphous layer on the surface. In the amorphization, the perfect diamond cubic transforms to some non-diamond phases, including the amorphous sp0, sp1, sp2and sp3hybridized structures and well-arranged sp2structures. However, the dominant phases are sp2and amorphous sp3phases. More interestingly, it is found that the removal rate strongly depends on the proportion of sp2hybridizations to amorphous sp3structures. In the ‘hard’ direction, phase transformation from amorphous sp3to sp2is difficult, and therefore a low proportion of sp2to amorphous sp3appears, which results in a small removal rate. In the ‘soft’ direction, phase transformation from amorphous sp3to sp2has less resistance, and a higher proportion output, which gives a greater removal rate. The variation laws as revealed above confirm that the removal rate anisotropy in diamond polishing is derived from the concentration of sp2hybridizations in the as-created amorphous layer and debris.
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