Microstructural Characterization of Electrodeposited Nanocrystalline Nickel Films by X-Ray Diffraction
Microstructural Characterization of Electrodeposited Nanocrystalline Nickel Films by X-Ray Diffraction
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X 射线衍射表征电沉积纳米晶镍薄膜的微观结构
DOI：
10.2472/jsms.64.528
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发表时间：
2015
期刊：
影响因子：
--
通讯作者：
Hirohisa Kimachi
中科院分区：
文献类型：
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作者：
Keisuke Tanaka;Y. Koike;K. Sano;Hiroto Tanaka;S. Machiya;T. Shobu;Hirohisa Kimachi
采用不同光亮剂含量的氨基磺酸盐溶液在两种镀液温度下电沉积制备了不同晶粒尺寸的镍纳米晶薄膜。通过X射线衍射（XRD）和透射电子显微镜（TEM）的傅立叶轮廓分析确定沉积膜的晶粒尺寸分布。对于200织构的薄膜，111-222衍射对的傅立叶分析所确定的晶粒尺寸比200-400衍射对的晶粒尺寸小，而对于具有随机取向的薄膜，则相反。TEM测得的晶粒尺寸分布服从对数正态分布。对于XRD和TEM的两种情况，对于较小的尺寸，方差较小。当111-222对的平均晶粒尺寸小于30 nm时，XRD测定的平均晶粒尺寸与TEM测定的平均晶粒尺寸一致，当111-222对的平均晶粒尺寸大于30 nm时，XRD测定的平均晶粒尺寸小于TEM测定的平均晶粒尺寸。用Scherrer的方法用111衍射确定的尺寸接近于用111-222对的傅立叶分析确定的尺寸，并且与用TEM确定的小于30 nm的尺寸一致。在较低的固溶温度下，晶粒尺寸随光亮剂含量的增加而减小。薄膜的屈服应力随晶粒尺寸的减小而增大，当晶粒尺寸小于20 nm时，薄膜的屈服应力几乎符合Hall-Petch关系。
Nickel nanocrystalline thin films with various grain sizes were produced by electrodeposition using sulfamate solution with different brightener contents at two bath temperatures. The distribution of the grain size of deposited films was determined by Fourier profile analysis of X-ray diffraction (XRD) and transmission electron microscopy (TEM). The grain size determined by Fourier analysis of 111-222 diffraction pairs gave smaller sizes than that of 200-400 diffraction pairs for thin films with 200 texture, while the reverse is true for films with random orientation. The distribution of grain sizes determined by TEM followed log-normal distribution. The variance was smaller for smaller sizes for both cases of XRD and TEM. The mean grain size determined by XRD of 111-222 pair agreed with that determined by TEM for sizes lower than 30 nm, while it was smaller for larger sizes. The size determined by Scherrer`s method using 111 diffraction was close to that determined by Fourier analysis of 111-222 pair, and agreed with that determined by TEM for sizes lower than 30 nm. The grain size decreased with increasing content of brightener at lower temperature of the solution bath. The yield stress of films increased with decreasing grain size, nearly following the Hall-Petch relation down to the grain size of 20 nm.
DOI：
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发表时间：
2010
期刊：
影响因子：
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作者：
小林公一;坂本信;Li GUOAN;田邊裕治;古賀良生;佐藤卓;大森豪;Keisuke Tanaka
通讯作者：
Keisuke Tanaka
X 射线衍射表征纳米晶镍薄膜的微观结构
DOI：
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发表时间：
2011
期刊：
Proceedings of Advanced Technology of Experimental Mechanics, ATEM' 11, Kobe
影响因子：
--
作者：
K. Tanaka;M. Sakakibara;H. Tanaka;H. Kimachi
通讯作者：
H. Kimachi
DOI：
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发表时间：
2010
期刊：
影响因子：
--
作者：
K. Tanaka;H. Asano and H. Kimachi
通讯作者：
H. Asano and H. Kimachi