Connection structures between type-I and type-II defects in neutron irradiated beta-Si3N4.

Connection structures between type-I and type-II defects in neutron irradiated beta-Si3N4.
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中子辐照β-Si3N4 中I 型和II 型缺陷之间的连接结构。

DOI:
10.1093/jmicro/52.3.267
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发表时间:
2003
期刊:
Journal of electron microscopy
影响因子:
--
通讯作者:
T. Yano
T. Yano
中科院分区:
--
文献类型:
--
作者:
M. Akiyoshi;T. Yano

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高分辨率电子显微镜(HREM)观察表明,高剂量中子辐照诱导β-Si3N4中产生多种类型的间质位错,其中两种位错已在我们之前的论文中进行了分析和报道。这两种有缺陷的结构称为I型和II型。它们是分别引入到[100]和[110]平面的间隙位错环。在这项研究中,发现其中一些位错环相互连接。通过HREM观察了I-L2-II-B型和I-R2-II-A型位错的连接。基于β-Si3N4 的简化晶体结构模型,提出了连接部分的四面体排列。此外,还发现了一种新型缺陷,即III型缺陷。 III型是引入[100]平面的间隙位错环。还发现I-A型位错和III型位错相互连接。
High-resolution electron microscopy (HREM) observation clarified that various types of interstitial dislocations were induced into beta-Si3N4 by high-dose neutron irradiation, and two of them have been analysed and reported in our previous papers. These two defective structures are called type-I and type-II. They are interstitial dislocation loops introduced into [100] and [110] planes, respectively. In this study, it was found that some of these dislocation loops connected with each other. The connections of type-I-L2-type-II-B and type-I-R2-type-II-A dislocations were observed by HREM. Tetrahedral arrangements of the connected parts are proposed, based on the simplified crystal structure model of beta-Si3N4. In addition, a new type of defect, type-III, was found. Type-III is an interstitial dislocation loop introduced into [100] planes. It was also found that type-I-A and type-III dislocations connected with each other.
DOI: 10.1080/01418619008244788
发表时间: 1990-10
影响因子: 1.6
作者:
T. Yano;T. Iseki
通讯作者: T. Yano;T. Iseki
T.Yano:“中子辐照氮化铝的热性能和机械性能”J.Nucl.Mater.(1990)
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发表时间: --
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影响因子: --
作者:
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发表时间: 2006
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作者:
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发表时间: 2006
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