Plasmonic Biosensing with Aluminum Thin Films under the Kretschmann Configuration.
Plasmonic Biosensing with Aluminum Thin Films under the Kretschmann Configuration.
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DOI:
10.1021/acs.analchem.0c01631
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发表时间:
2020-07-07
影响因子:
7.4
通讯作者:
Cheng Q
中科院分区:
文献类型:
--
作者:
Lambert AS;Valiulis SN;Malinick AS;Tanabe I;Cheng Q
Aluminum has recently attracted considerable interest as plasmonic material due to its unique optical properties, but most work has been limited to nanostructures. We report here novel SPR biosensing with aluminum thin-films using the standard Kretschmann configuration that has previously been dominated by gold films. Electron-beam physical vapor deposition (EBPVD)-prepared Al films oxidize in air to form a nanofilm of Al2O3, yielding robust stability for sensing applications in buffered solutions. FDTD simulations revealed a sharp plasmonic dip in the visible range that enables measurement of both angular shift and reflection intensity change at a fixed angle. Bulk and surface tests indicated that Al films exhibited superb sensitivity performance in both categories. Compared to Au, the Al/Al2O3 layer showed a marked effect of suppressing non-specific binding from proteins in human serum. Further characterization indicated that Al film demonstrated a higher sensitivity and a wider working range than Au films when used for SPR imaging analysis. Combined with its economic and manufacturing benefits, the Al thin-film has the potential to become a highly advantageous plasmonic substrate to meet a wide range of biosensing needs in SPR configurations.
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影响因子:
7.4
作者:
Abbas, Abdennour;Linman, Matthew J.;Cheng, Quan
通讯作者:
Cheng, Quan
影响因子:
10.8
作者:
Hobbs, Richard G.;Manfrinato, Vitor R.;Berggren, Karl K.
通讯作者:
Berggren, Karl K.
影响因子:
4.6
作者:
Beeg, Marten;Nobili, Alessandro;Gobbi, Marco
通讯作者:
Gobbi, Marco
DOI:
10.1016/s0927-7757(00)00821-9
发表时间:
2001-06-30
影响因子:
5.2
作者:
Karaman, ME;Antelmi, DA;Pashley, RM
通讯作者:
Pashley, RM
影响因子:
1
作者:
Arora, Pankaj;Awasthi, Harsh V.
通讯作者:
Awasthi, Harsh V.