Acceptor-oxygen defects in silicon: The electronic properties of centers formed by boron, gallium, indium, and aluminum interactions with the oxygen dimer
Acceptor-oxygen defects in silicon: The electronic properties of centers formed by boron, gallium, indium, and aluminum interactions with the oxygen dimer
复制标题
硅中的受主氧缺陷:硼、镓、铟和铝与氧二聚体相互作用形成的中心的电子特性
DOI:
10.1063/5.0076980
复制
发表时间:
2021
影响因子:
3.2
通讯作者:
De Guzman J
中科院分区:
文献类型:
--
作者:
De Guzman J
DOI:
10.1002/pssa.201900315
发表时间:
2019
期刊:
physica status solidi (a)
影响因子:
--
作者:
V. Markevich;M. Vaqueiro;J. T. D. de Guzman;J. Coutinho;P. Santos;I. Crowe;M. Halsall;I. Hawkins;S. Lastovskii;L. I. Murin;A. Peaker
通讯作者:
A. Peaker