Thickness dependence of spin polarization and electronic structure of ultra-thin films of MoS2 and related transition-metal dichalcogenides.
Thickness dependence of spin polarization and electronic structure of ultra-thin films of MoS2 and related transition-metal dichalcogenides.
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MOS2的超薄膜和相关过渡金属二核苷的超薄膜的自旋极化和电子结构的厚度依赖性。
DOI:
10.1038/srep06270
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发表时间:
2014-09-05
影响因子:
4.6
通讯作者:
Bansil A
中科院分区:
文献类型:
--
作者:
Chang TR;Lin H;Jeng HT;Bansil A
We have carried out thickness dependent first-principles electronic structure calculations on ultra-thin films of transition-metal dichalcogenides MX2 (M = Mo or W; X = S, Se, or Te). When spin-orbit coupling (SOC) is included in the computations, monolayer MX2 thin films display spin-split states around the valence band maximum at the Brillouin zone corners with nearly 100% spin polarization. The spins are aligned oppositely along out-of-the-plane direction at the K and K′ points. For the bilayer films, spin polarization of this SOC induced band splitting can be switched on or off by an out-of-the-plane external electric field. The spin-polarized states are weakly coupled between the layers in bulk MX2 compounds with small kz dispersion. We confirm a transition from an indirect to direct band gap as the thickness is reduced to a monolayer in MoS2, in agreement with recent experimental findings. Owing to the presence of a large spin-splitting energy and an insulating band gap, MX2 compounds have great potential for spin/valley electronic applications at room temperature.
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影响因子:
56.9
作者:
Bernevig, B. Andrei;Hughes, Taylor L.;Zhang, Shou-Cheng
通讯作者:
Zhang, Shou-Cheng
影响因子:
56.9
作者:
Koenig, Markus;Wiedmann, Steffen;Zhang, Shou-Cheng
通讯作者:
Zhang, Shou-Cheng
影响因子:
3.7
作者:
Kresse, G;Furthmuller, J
通讯作者:
Furthmuller, J
DOI:
10.1088/0022-3719/5/7/007
发表时间:
1972-01-01
期刊:
JOURNAL OF PHYSICS PART C SOLID STATE PHYSICS
影响因子:
--
作者:
BROMLEY, RA;YOFFE, AD;MURRAY, RB
通讯作者:
MURRAY, RB
影响因子:
2.1
作者:
Bolotin, K. I.;Sikes, K. J.;Stormer, H. L.
通讯作者:
Stormer, H. L.