Research into the electrical property variation of undoped CdTe and ZnTe crystals grown under Te-rich conditions
Research into the electrical property variation of undoped CdTe and ZnTe crystals grown under Te-rich conditions
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富Te条件下生长的未掺杂CdTe和ZnTe晶体电学性能变化研究
DOI:
10.1016/j.jallcom.2014.05.167
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发表时间:
2014-11
影响因子:
6.2
通讯作者:
Wanqi Jie
中科院分区:
文献类型:
--
作者:
Hang Liu;Yihui He;Rui Yang;Wanqi Jie
Both undoped ZnTe and CdTe bulk single crystals are grown under Te-saturated conditions from the solution and melt, respectively. To give an insight into the variation of the electrical properties, the defects structures in both tellurides are discussed. According to the actual growth velocities and the entire cooling history, tellurium interstitials (Tei) and Zinc vacancies (VZn) are proposed as the dominant grown-in defects, account for the low resistivity of p-type ZnTe. However, relatively high pulling rates and slow cooling-down processes result in tellurium anti-sites (TeCd) as the principle grown-in defects, leading to the high resistivity of light n-type CdTe. Further low-temperature (8.6 K) photoluminescence spectra of both tellurides are obtained. The donor–acceptor pair (DAP) and recombination of free electron to neutral acceptor (eA) dominate the luminescence, however, with their intensities are anti-correlated. eA is superior to DAP in undoped Te-rich ZnTe, suggests a high concentration of Teior VZn. On the contrary, DAP is the principal emission for undoped Te-rich CdTe. In addition, V-line is clearly identified in undoped Te-rich ZnTe, which possibly associated with VZnor close Frenkel pair VZn–Zni.
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影响因子:
3.3
作者:
S. V. Plyatsko;T. L. Petrenko;F. Sizov
通讯作者:
S. V. Plyatsko;T. L. Petrenko;F. Sizov
DOI:
10.1103/physrevb.39.3192
发表时间:
1989-02
期刊:
Physical review. B, Condensed matter
影响因子:
--
作者:
Jansen;Sankey
通讯作者:
Jansen;Sankey
影响因子:
4
作者:
J. Chang;M. Cho;H. M. Wang;H. Wenisch;T. Hanada;T. Yao;K. Sato;O. Oda
通讯作者:
J. Chang;M. Cho;H. M. Wang;H. Wenisch;T. Hanada;T. Yao;K. Sato;O. Oda
影响因子:
1.8
作者:
R. Triboulet;K. P. Van;G. Didier
通讯作者:
R. Triboulet;K. P. Van;G. Didier
影响因子:
1.8
作者:
V. Babentsov;R. James
通讯作者:
V. Babentsov;R. James