Densification and grain growth of CuO-doped Pr6O11 varistors
Densification and grain growth of CuO-doped Pr6O11 varistors
复制标题
CuO 掺杂 Pr6O11 压敏电阻的致密化和晶粒生长
DOI:
10.1016/j.ceramint.2010.02.028
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发表时间:
2010-07
影响因子:
5.2
通讯作者:
Hua, Z. Q.
中科院分区:
文献类型:
--
作者:
Zhao, H. W.;Dong, L.;Wang, Y.;Li, T. Y.;Wang, H. Q.;Hua, Z. Q.
The effect of CuO doping on the microstructure and electrical properties of Pr6O11varistors was investigated. Samples were prepared by conventional ceramic techniques, and were sintered at 1150°C in air for 2h. The microstructure was investigated by scanning electron microscopy (SEM). The phases and chemical composition were analyzed by X-ray diffraction (XRD) and energy dispersive spectroscopy (EDS). The results indicated that CuO can promote the densification of the Pr6O11-based varistors to 95.8% of the theoretical density. CuO forms a solid solution with Pr6O11up to 0.5mol%, above which Pr2CuO4precipitates in the grain boundary. From the I–V measurements, minor CuO doping can improve the nonlinear electrical properties. A further increase in CuO content induces a reduction in the nonlinear electrical properties due to the consumption of absorbed oxygen on the grain surfaces.
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影响因子:
3.2
作者:
L. Levinson;H. Philipp
通讯作者:
L. Levinson;H. Philipp
影响因子:
4.6
作者:
Xinsheng Yang;Yu Wang;Yong Zhao
通讯作者:
Xinsheng Yang;Yu Wang;Yong Zhao
影响因子:
--
作者:
Naijun Zhou;Xiaoxia Xia;Fu-qiang Wang
通讯作者:
Naijun Zhou;Xiaoxia Xia;Fu-qiang Wang
DOI:
10.4028/www.scientific.net/kem.336-338.793
发表时间:
2007-04
期刊:
Key Engineering Materials
影响因子:
--
作者:
Huiming Ji;Xiao Liu;Y. Lv;Cui Li;Xiao Dong Chen
通讯作者:
Huiming Ji;Xiao Liu;Y. Lv;Cui Li;Xiao Dong Chen
影响因子:
5.4
作者:
Z. Kang;L. Eyring
通讯作者:
Z. Kang;L. Eyring