Ground-state properties of metal/organic-ferromagnet heterojunctions
Ground-state properties of metal/organic-ferromagnet heterojunctions
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金属/有机铁磁体异质结的基态特性
DOI：
10.1103/physrevb.98.235415
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发表时间：
2018-12
影响因子：
3.7
通讯作者：
Hui Guichao
中科院分区：
文献类型：
--
作者：
Miao Yuanyuan;Qiu Shuai;Zhang Guangping;Ren Junfeng;Wang Chuankui;Hui Guichao
基于包含电子-晶格相互作用和Hubbard项的类Anderson-like模型，研究了金属/有机铁磁体异质结的基态性质.铁磁和铁磁金属都被认为是。结果揭示了有机铁磁体中电子注入和诱导激发的图像，随着注入电子的增加，有机铁磁体中的诱导激发分为两个区域：第一个类孤子界面态和随后的界面态与极化子态共存。通过对分子自洽哈密顿量的分析，利用浅态和局域波函数进一步研究了界面态。在铁磁金属的情况下，金属和有机铁磁体之间的磁化取向对齐的效果进行了讨论，其中最低的注入势垒被发现时，两个组件的磁化取向是平行的。注入引起的有机铁磁体的磁性退化也得到了。本文提供了一个基本的理解，金属/有机铁磁界面，这是必不可少的进一步自旋电子学研究在有机铁磁器件。
Based on an Anderson-like model including the electron-lattice interaction and a Hubbard term, the ground-state properties of metal/organic-ferromagnet heterojunctions are investigated. Both the nonmagnetic and ferromagnetic metals are considered. The results reveal a picture of electron injection and the induced excitations in the organic ferromagnets, which is divided into two regimes with the increase of injected electrons: the first solitonlike interfacial state and the subsequent coexistence of the interfacial state and polaron states. The interfacial state is further explored by the shallow states and localized wave functions with the analysis of the molecular self-consistent Hamiltonian. In the case of the ferromagnetic metal, the effect of the magnetization orientation alignment between the metal and the organic ferromagnet is discussed, where the lowest injection barrier is found when the magnetization orientations of the two components are parallel. An injection-induced degradation of the magnetism of the organic ferromagnet is also obtained. This paper provides a basic understanding of the metal/organic-ferromagnet interface, which is essential for further spintronic study in organic ferromagnetic devices.
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影响因子：
3.2
作者：
Bin Li;Mengqi Zhou;Yu Lu;Chi-yueh Kao;Jung‐Woo Yoo;V. Prigodin;A. Epstein
通讯作者：
Bin Li;Mengqi Zhou;Yu Lu;Chi-yueh Kao;Jung‐Woo Yoo;V. Prigodin;A. Epstein
影响因子：
8.6
作者：
TAKAHASHI, M;TUREK, P;KINOSHITA, M
通讯作者：
KINOSHITA, M
影响因子：
3.7
作者：
Weizong Wang
通讯作者：
Weizong Wang
影响因子：
--
作者：
S. Roth;H. Bleier
通讯作者：
S. Roth;H. Bleier
影响因子：
3.7
作者：
Weizong Wang
通讯作者：
Weizong Wang