Combining in-situ lithography with 3D printed solid immersion lenses for single quantum dot spectroscopy.

Combining in-situ lithography with 3D printed solid immersion lenses for single quantum dot spectroscopy.
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DOI:
10.1038/srep39916
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发表时间:
2017-01-06
期刊:
影响因子:
4.6
通讯作者:
Michler P
Michler P
中科院分区:
综合性期刊3区
文献类型:
--
作者:
Sartison M;Portalupi SL;Gissibl T;Jetter M;Giessen H;Michler P

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在本研究中,我们报道了在光刻预选半导体量子点(QDs)上确定制备固体浸没透镜(SILs)的方法。我们展示了最先进的低温原位光刻和飞秒3D直接激光书写的结合。使用低温光刻技术预先选择了几个定位精度小于2nm的量子点,然后使用三维激光写入技术在量子发射器顶部以亚微米精度确定地制造半球面透镜。由于采用了打印透镜,QD光提取效率提高了2倍,泵浦激光聚焦更强,信噪比提高,从而提高了QD的定位精度,远低于1 nm。此外,还报道了量子点特性的变化,即由印刷透镜引起的应变和内部量子效率的变化。
In the current study, we report on the deterministic fabrication of solid immersion lenses (SILs) on lithographically pre-selected semiconductor quantum dots (QDs). We demonstrate the combination of state-of-the-art low-temperature in-situ photolithography and femtosecond 3D direct laser writing. Several QDs are pre-selected with a localization accuracy of less than 2 nm with low-temperature lithography and three-dimensional laser writing is then used to deterministically fabricate hemispherical lenses on top of the quantum emitter with a submicrometric precision. Due to the printed lenses, the QD light extraction efficiency is enhanced by a factor of 2, the pumping laser is focused more, and the signal-to-noise ratio is increased, leading to an improved localization accuracy of the QD to well below 1 nm. Furthermore, modifications of the QD properties, i.e. strain and variation of internal quantum efficiency induced by the printed lenses, are also reported.
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