Mechanism of template removal for the synthesis of molecular sieves using dielectric barrier discharge
Mechanism of template removal for the synthesis of molecular sieves using dielectric barrier discharge
复制标题
介质阻挡放电合成分子筛脱模板机理
DOI：
10.1016/j.cattod.2015.03.009
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发表时间：
2015-11
期刊：
影响因子：
5.3
通讯作者：
Liu, Chang-jun
中科院分区：
文献类型：
--
作者：
Liu, Yuan;Wang, Zhao;Liu, Chang-jun
分子筛广泛应用于催化、分离等领域。各种有机模板剂通常用于分子筛的合成。然而，在合成后必须在升高的温度下进行热处理以除去模板。高温操作会破坏分子筛的结构。介质阻挡放电（DBD）等离子体技术，在环境条件下启动，最近开发的快速，安全和容易地从分子筛去除模板剂。在这项工作中，DBD等离子体去除模板的机制进行了研究。研究证实了DBD等离子体增强模板去除的机理是活性物种（如电子和激发态氧物种）对模板分子的解离和活性氧物种（如臭氧和激发态氧物种）对自由基（来自解离）的氧化。热图像证实DBD等离子体模板去除在约125 °C的温度下进行。热效应可以忽略不计。本研究为各种微孔和介孔材料的合成开辟了一条独特的途径。
Molecular sieves are extensively employed in catalysis, separation and many other fields. Various organic templates are commonly applied for the synthesis of molecular sieves. However, thermal treatment has to be conducted at elevated temperature to remove the template after synthesis. The high temperature operation may destroy the structure of molecular sieves. A dielectric-barrier discharge (DBD) plasma technique, initiated at ambient conditions, was recently developed for the quick, safe and easy removal of templates from molecular sieves. In this work, the mechanism of DBD plasma template removal is investigated. The study confirms that dissociation of template molecule by active species (like electrons and excited oxygen species) and oxidation of radicals (from the dissociation) by active oxygen species (like ozone and excited oxygen species) are the mechanism of the DBD plasma enhanced template removal. The thermal image confirms that the DBD plasma template removal is conducted under temperature around 125 °C. The thermal effect can be ignored. The present study is leading to a unique way for the syntheses of various micro- and meso-porous materials.
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