Coating Conditions of SCO Single Buffer Layer via Slot-Die Technique

Coating Conditions of SCO Single Buffer Layer via Slot-Die Technique
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狭缝模头技术SCO单缓冲层的涂覆条件

DOI:
10.1109/tasc.2016.2542271
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发表时间:
2016-03
影响因子:
1.8
通讯作者:
Zhao, Y.
Zhao, Y.
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Lei, M.;Zhang, Y.;Zhao, Y.

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采用聚合物辅助化学溶液沉积法和狭缝模涂覆技术制备了Sm0.2Ce0.8O1.9-x(SCO)单缓冲层。通过控制涂覆条件,即:溶液的粘度、胶带的移动速度和溶液的释放速率。
A Sm0.2Ce0.8O1.9-x (SCO) single buffer layer was prepared by a polymer-assisted chemical solution deposition method and a slot-die coating technique for YBCO coated conductors. The smooth, uniform, and crack-free SCO buffer layer with sharp (200) c-axis orientation and high texture has been obtained by controlling the coating conditions, i.e., the viscosity of solution, the moving speed of tape, and the release rate of solution.
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