Microlens array based three-dimensional light field projection and possible applications in photolithography
Microlens array based three-dimensional light field projection and possible applications in photolithography
复制标题
基于微透镜阵列的三维光场投影及其在光刻中的可能应用
DOI:
10.1117/12.2536951
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发表时间:
2019
期刊:
影响因子:
--
通讯作者:
Wen, Sy-Bor
中科院分区:
文献类型:
--
作者:
Zhang, Hongjie;Wen, Sy-Bor
A three-dimensional (3D) system is developed with a microlens array (MLA) and a digital micromirror device (DMD) type spatial light modulator (SLM) to perform light field projection. In order to get 3D projections, a pixel value map, i.e. elemental images, is required to be loaded into SLM. Algorithm to render elemental images is developed in this study using ray tracing. The reconstructed 3D projection, which is the 3D output of the system, is examined by cameras at different focal positions. The result shows that the intended projection patterns are correctly reconstructed. The light field projection method can be extended to photolithography when photoresist is exposed to reveal the 3D structures of the intended projection. Compared with current 3D lithography, the proposed MLA based projection/lithography can reconstruct micro-structure with 3D curved structures in a single projection, which can significantly improve the 3D fabrication speed and quality. With the future implementation of optical compression and femtosecond laser, the proposed technique has the capability of conduct large area microfabrication with resolutions better than diffraction limit at a very high speed.
DOI:
--
发表时间:
1988
期刊:
Medical Imaging
影响因子:
--
作者:
J. Melngailis
通讯作者:
J. Melngailis
DOI:
--
发表时间:
2013
期刊:
SIGGRAPH Talks
影响因子:
--
作者:
Boyang Zheng;Guiping Sun
通讯作者:
Guiping Sun