Microlens array based three-dimensional light field projection and possible applications in photolithography

Microlens array based three-dimensional light field projection and possible applications in photolithography
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基于微透镜阵列的三维光场投影及其在光刻中的可能应用

DOI:
10.1117/12.2536951
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发表时间:
2019
期刊:
2019
影响因子:
--
通讯作者:
Wen, Sy-Bor
Wen, Sy-Bor
中科院分区:
--
文献类型:
--
作者:
Zhang, Hongjie;Wen, Sy-Bor

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相似文献

采用微透镜阵列(MLA)和数字微镜器件(DMD)型空间光调制器(SLM)开发了三维(3D)系统来执行光场投影。为了获得 3D 投影,需要将像素值图(即元素图像)加载到 SLM 中。本研究使用光线追踪开发了渲染元素图像的算法。重建的 3D 投影是系统的 3D 输出,由不同焦点位置的摄像机进行检查。结果表明,预期的投影图案被正确重建。当光刻胶曝光时,光场投影方法可以扩展到光刻,以显示预期投影的 3D 结构。与当前的3D光刻相比,所提出的基于MLA的投影/光刻可以在单次投影中重建具有3D弯曲结构的微结构,这可以显着提高3D制造速度和质量。随着光学压缩和飞秒激光的未来实现,所提出的技术具有以非常高的速度进行分辨率优于衍射极限的大面积微加工的能力。
A three-dimensional (3D) system is developed with a microlens array (MLA) and a digital micromirror device (DMD) type spatial light modulator (SLM) to perform light field projection. In order to get 3D projections, a pixel value map, i.e. elemental images, is required to be loaded into SLM. Algorithm to render elemental images is developed in this study using ray tracing. The reconstructed 3D projection, which is the 3D output of the system, is examined by cameras at different focal positions. The result shows that the intended projection patterns are correctly reconstructed. The light field projection method can be extended to photolithography when photoresist is exposed to reveal the 3D structures of the intended projection. Compared with current 3D lithography, the proposed MLA based projection/lithography can reconstruct micro-structure with 3D curved structures in a single projection, which can significantly improve the 3D fabrication speed and quality. With the future implementation of optical compression and femtosecond laser, the proposed technique has the capability of conduct large area microfabrication with resolutions better than diffraction limit at a very high speed.
聚焦离子束微加工
DOI: --
发表时间: 1988
期刊: Medical Imaging
影响因子: --
作者:
J. Melngailis
通讯作者: J. Melngailis
国际计算机图形和交互技术会议,SIGGRAPH 2013,美国加利福尼亚州阿纳海姆,2013 年 7 月 21-25 日,会谈记录
DOI: --
发表时间: 2013
期刊: SIGGRAPH Talks
影响因子: --
作者:
Boyang Zheng;Guiping Sun
通讯作者: Guiping Sun