Interaction induced topological protection in one‐dimensional conductors
Interaction induced topological protection in one‐dimensional conductors
复制标题
一维导体中的相互作用诱导拓扑保护
DOI：
10.1002/prop.201600054
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发表时间：
2016
期刊：
影响因子：
--
通讯作者：
S. Carr
中科院分区：
文献类型：
--
作者：
N. Kainaris;R. Santos;R. Santos;D. Gutman;S. Carr
我们讨论了两个一维模型系统-第一个是具有Ising各向异性的单通道量子线，而第二个是两个耦合的螺旋边缘态。我们发现这两个模型都受相同的低能量有效场论的支配，并且相互作用驱动两个系统都表现出金属相，但所有的单粒子激发都是间隙的。我们证明这样的状态可以是拓扑的，也可以是平凡的；在前一种情况下，系统表现出无间隙的末端状态，并且对无序不敏感。
We discuss two one‐dimensional model systems – the first is a single channel quantum wire with Ising anisotropy, while the second is two coupled helical edge states. We show that the two models are governed by the same low energy effective field theory, and interactions drive both systems to exhibit phases which are metallic, but with all single particle excitations gapped. We show that such states may be either topological or trivial; in the former case, the system demonstrates gapless end states, and insensitivity to disorder.
影响因子：
8.6
作者：
Schmidt, Thomas L.;Rachel, Stephan;Glazman, Leonid I.
通讯作者：
Glazman, Leonid I.