Infrared optical properties modulation of VO(2) thin film fabricated by ultrafast pulsed laser deposition for thermochromic smart window applications.
Infrared optical properties modulation of VO(2) thin film fabricated by ultrafast pulsed laser deposition for thermochromic smart window applications.
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DOI：
10.1038/s41598-022-15439-5
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发表时间：
2022-07-06
影响因子：
4.6
通讯作者：
Jose, Gin
中科院分区：
文献类型：
--
作者：
Barimah, Eric Kumi;Boontan, Artitsupa;Steenson, David P.;Jose, Gin
多年来，二氧化钒（VO 2（M1））已被广泛用于制造热致变色薄膜，重点是使用外部刺激，如热，以调节可见光到近红外透射率，以提高建筑物的能源效率和室内舒适度。因此，将热致变色材料的研究扩展到中红外（MIR）波长的应用，如智能辐射器件，是有价值的。除此之外，合成纯VO 2（M1）薄膜存在许多挑战，因为大多数制造技术需要对沉积的薄膜进行后退火，以将非晶VO 2转化为晶相。在这里，我们提出了一种直接的方法来制造更厚的VO 2（M1）薄膜上的热二氧化硅基板（在基板温度为400 °C和700 °C）从五氧化二钒（V2 O 5）的前体材料。使用高重复率（10 kHz）飞秒激光来存款V2 O 5，从而形成VO 2（M1），而无需任何后退火步骤。研究了表面形态、结构性质和UV-可见光光学性质，包括光学带隙和复折射率，作为基底温度的函数，并在下文中报道。透射电子显微镜（TEM）和X射线衍射研究证实，在700 °C下沉积的VO 2（M1）薄膜主要是高度织构化的多晶单斜晶体结构。利用温度相关的透射率测量方法，研究了2.5-5.0 μm波长范围内的中红外热致变色特性。对于在700 °C下制备的样品，从金属到半导体的一级相变和相变的滞后带宽分别为64.4 °C和12.6 °C。热光发射率特性表明，这些VO 2（M1）薄膜与飞秒激光沉积制造的辐射热管理或控制，通过主动节能窗的建筑物，卫星和航天器具有很强的潜力。
Over the years, vanadium dioxide, (VO2(M1)), has been extensively utilised to fabricate thermochromic thin films with the focus on using external stimuli, such as heat, to modulate the visible through near-infrared transmittance for energy efficiency of buildings and indoor comfort. It is thus valuable to extend the study of thermochromic materials into the mid-infrared (MIR) wavelengths for applications such as smart radiative devices. On top of this, there are numerous challenges with synthesising pure VO2 (M1) thin films, as most fabrication techniques require the post-annealing of a deposited thin film to convert amorphous VO2 into a crystalline phase. Here, we present a direct method to fabricate thicker VO2(M1) thin films onto hot silica substrates (at substrate temperatures of 400 °C and 700 °C) from vanadium pentoxide (V2O5) precursor material. A high repetition rate (10 kHz) femtosecond laser is used to deposit the V2O5 leading to the formation of VO2 (M1) without any post-annealing steps. Surface morphology, structural properties, and UV–visible optical properties, including optical band gap and complex refractive index, as a function of the substrate temperature, were studied and reported below. The transmission electron microscopic (TEM) and X-ray diffraction studies confirm that VO2 (M1) thin films deposited at 700 °C are dominated by a highly texturized polycrystalline monoclinic crystalline structure. The thermochromic characteristics in the mid-infrared (MIR) at a wavelength range of 2.5–5.0 μm are presented using temperature-dependent transmittance measurements. The first-order phase transition from metal-to-semiconductor and the hysteresis bandwidth of the transition were confirmed to be 64.4 °C and 12.6 °C respectively, for a sample fabricated at 700 °C. Thermo-optical emissivity properties indicate that these VO2 (M1) thin films fabricated with femtosecond laser deposition have strong potential for both radiative thermal management or control via active energy-saving windows for buildings, and satellites and spacecraft.
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影响因子：
56.9
作者：
Jeong, Jaewoo;Aetukuri, Nagaphani;Parkin, Stuart S. P.
通讯作者：
Parkin, Stuart S. P.
DOI：
10.1007/s11595-012-0563-7
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