Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media
Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media
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纳米压印光刻与嵌段共聚物定向自组装相结合，用于制造位图介质的亚 20 nm 模板
DOI：
10.1088/0957-4484/25/39/395301
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发表时间：
2014
期刊：
影响因子：
3.5
通讯作者：
D. Kuo
中科院分区：
文献类型：
--
作者：
Xiaoming Yang;S. Xiao;Wei Hu;J. Hwu;R. V. D. van de Veerdonk;K. Wago;Kim Y. Lee;D. Kuo
我们提出了一种新颖的策略，将纳米压印光刻 (NIL) 技术与嵌段共聚物 (BCP) 的定向自组装 (DSA) 相结合，为亚 20 nm 密集图案化提供稳健、高产量和低缺陷密度的路径。通过这种新的 NIL-DSA 方法，UV 纳米压印抗蚀剂被用作 DSA 共聚物预图案，以加快 DSA 过程。该方法已成功用于制造用于位图案介质（BPM）应用的 1.0 Td in−2 伺服集成纳米压印模板。制作的模板用于 2.5 英寸圆盘上的 UV 固化 NIL。使用离子束蚀刻通过碳硬掩模将压印抗蚀剂图案进一步转移到下面的CoCrPt磁性层中。 NIL技术与DSA工艺的成功集成为我们提供了一条BPM纳米加工的新途径，其中包括以下三大优势：（1）更简单、更快速地实现高密度BPM图案化的DSA； (2) 一种通过迭代压印-DSA-模板程序制造高质量点图案模板的新方法； (3) 一种简单的集成方案，用于实现具有 BCP 模式的非周期伺服功能，从而加速 DSA 技术从实验室研究到 BPM 制造环境的转变。
We propose a novel strategy to integrate the nanoimprint lithography (NIL) technique with directed self-assembly (DSA) of block copolymer (BCP) for providing a robust, high-yield, and low-defect-density path to sub-20 nm dense patterning. Through this new NIL-DSA method, UV nanoimprint resist is used as the DSA copolymer pre-pattern to expedite the DSA process. This method was successfully used to fabricate a 1.0 Td in−2 servo-integrated nanoimprint template for bit-patterned media (BPM) application. The fabricated template was used for UV-cure NIL on a 2.5-inch disk. The imprint resist patterns were further transferred into the underlying CoCrPt magnetic layer through a carbon hard mask using ion beam etching. The successful integration of the NIL technique with the DSA process provides us with a new route to BPM nanofabrication, which includes the following three major advantages: (1) a simpler and faster way to implement DSA for high-density BPM patterning; (2) a novel method for fabricating a high-quality dot pattern template through an iterative imprint-DSA-template procedure; and (3) an uncomplicated integration scheme for implementing non-periodic servo features with BCP patterns, thus accelerating the transition of moving the DSA technique from laboratory research to the BPM manufacturing environment.
抗蚀图案引导对称二嵌段共聚物自组装
DOI：
--
发表时间：
2006
期刊：
Journal of Photopolymer Scinece and Technology 19
影响因子：
--
作者：
三浦陽子;他;T. Yamaguchi
通讯作者：
T. Yamaguchi