Corona Charge in SiO2: Kinetics and Surface Passivation for High Efficiency Silicon Solar Cells☆
Corona Charge in SiO2: Kinetics and Surface Passivation for High Efficiency Silicon Solar Cells☆
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SiO2 中的电晕电荷:高效硅太阳能电池的动力学和表面钝化☆
DOI:
10.1016/j.egypro.2016.07.090
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发表时间:
2016
期刊:
影响因子:
--
通讯作者:
P. Wilshaw
中科院分区:
文献类型:
--
作者:
R. S. Bonilla;N. Jennison;D. Clayton;Katherine A. Collett;L. Rands;P. Wilshaw
This manuscript presents a method by which capacitance-voltage measurements can be used in conjunction with Kelvin-probe measurements to calculate the location of charge within a dielectric layer. A first order kinetic model for the transport of charge into SiO 2 films after exposure to corona charge deposition is proposed. The rate limiting step for charge migration into oxide films has been observed to be the injection of charge from the surface (air -SiO2 interface). The charge lies preferentially at the air-SiO 2 and SiO2 -Si interfaces, and its injection into SiO2 has been characterized as having an activation energy of ~ 50 meV. In this work, corona charge deposition has produced SRV < 2.7 cm/s and J 01 < 12 fA/cm^2 which is within the requirements of high efficiency silicon solar cells. These results contribute to the understanding of corona charge interaction with SiO2 with a view to its potential application as an extrinsic method of passivation for highly efficient silicon solar cells.
DOI:
10.4028/www.scientific.net/ssp.242.67
发表时间:
2015
期刊:
Solid State Phenomena
影响因子:
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作者:
Bonilla R
通讯作者:
Bonilla R