Fabrication of a curved microlens array using double gray-scale digital maskless lithography
Fabrication of a curved microlens array using double gray-scale digital maskless lithography
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使用双灰度数字无掩模光刻制造弯曲微透镜阵列
DOI：
10.1088/1361-6439/aa596a
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发表时间：
2017-02
影响因子：
2.3
通讯作者：
Zhang Zhimin
中科院分区：
文献类型：
--
作者：
Luo Ningning;Zhang Zhimin
数字无掩模光刻技术被认为是一种高效率、低成本的微结构制造方法，但受到空间光调制器灰度能力的限制。本文提出了一种新的双灰度数字无掩模光刻技术，用于形成弯曲微透镜阵列。首先将曲面微透镜阵列的目标暴露剂量谱分割成两个独立的三维能量谱，然后利用单个灰度数字光刻分别实现每个三维能量谱。将投影计算得到的两个灰度数字掩模叠加在基板上，实现弯曲微透镜阵列的暴露剂量分布。因此，通过光阻剂对调制UV曝光的响应实现的有效步骤加倍，因此可以通过双灰度掩模的精确调制形成具有陡峭梯度的平滑轮廓。利用双灰度法，在1024µm × 768µm的球面上成功制备了183个微透镜的曲面微透镜阵列。
Digital maskless lithography is considered to be a high-efficiency and low-cost approach for the fabrication of microstructures, but is limited by the gray scale capability of spatial light modulators. In this work, a novel method of double gray-scale digital maskless lithography is presented for forming a curved microlens array. The target exposure dose profile of the curved microlens array is first split into two individual 3D energy profiles, and then each 3D energy profile can be respectively realized by a single gray-scale digital lithography. Two gray-scale digital masks obtained by projection calculation are superposed on the substrate so as to realize the exposure dose profile of the curved microlens array. Thus, the effective steps that are achieved through the photoresist response to the modulated UV exposure are doubled, so a smoother profile with a steep gradient can be formed by the precise modulation of double gray-scale masks. As a result of the double gray-scale method, a curved microlens array with 183 micro lenslets on a 1024 µm × 768 µm spherical surface has been successfully fabricated.
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影响因子：
2.3
作者：
Haeryung Kim;S. K. Moon;Manseung Seo
通讯作者：
Haeryung Kim;S. K. Moon;Manseung Seo
DOI：
10.1088/0960-1317/19/10/105010
发表时间：
2009-10
影响因子：
2.3
作者：
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DOI：
--
发表时间：
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期刊：
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影响因子：
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