Source distribution dependent scatter correction for PVI

Source distribution dependent scatter correction for PVI
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PVI 的源分布相关散射校正

DOI:
10.1109/23.256701
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发表时间:
1993
影响因子:
1.4
通讯作者:
C. Dykstra
C. Dykstra
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
J. S. Barney;R. Harrop;C. Dykstra

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依赖于震源分布的散射校正方法包含了不同数量的关于震源位置和物质分布的信息。该技术采用图像到投影的积分变换,结合不同程度的散射材料分布信息,或采用卷积减法,其中一种卷积方法包含了散射材料的一些信息。为了测试这些技术,将它们应用于蒙特卡罗模拟生成的数据,该模拟使用几何形状或体素化密度图来模拟散射材料。发现源位置和物质分布对散射校正有一定的影响。结合密度图的图像到投影方法可以产生精确的散射校正,但计算成本很高。更简单的方法,图像到投影和卷积,也可以提供有效的散射校正。>
Source distribution dependent scatter correction methods which incorporate different amounts of information about the source position and material distribution are developed and tested. The techniques use image to projection integral transformation, incorporating varying degrees of information on the distribution of scattering material, or convolution subtraction methods, with some information about the scattering material included in one of the convolution methods. To test the techniques, they are applied to data generated by Monte Carlo simulations which use geometric shapes or a voxelized density map to model the scattering material. Source position and material distribution are found to have some effect on scatter correction. An image to projection method which incorporates a density map produces accurate scatter correction but is computationally expensive. Simpler methods, both image to projection and convolution, can also provide effective scatter correction. >
DOI: --
发表时间: 1990-05
期刊: Journal of nuclear medicine : official publication, Society of Nuclear Medicine
影响因子: --
作者:
Joel S. Karp;G. Muehllehner;D. Mankoff;Caesar E. Ordonez;John M. Ollinger;M. Daube-Witherspoon;Arthur T. Haigh;D. Beerbohm
通讯作者: Joel S. Karp;G. Muehllehner;D. Mankoff;Caesar E. Ordonez;John M. Ollinger;M. Daube-Witherspoon;Arthur T. Haigh;D. Beerbohm