Preparation of Cr2O3/Al2O3 bipolar oxides as hydrogen permeation barriers by selective oxide removal on SS and atomic layer deposition
Preparation of Cr2O3/Al2O3 bipolar oxides as hydrogen permeation barriers by selective oxide removal on SS and atomic layer deposition
复制标题
通过选择性去除 SS 上的氧化物和原子层沉积制备 Cr2O3/Al2O3 双极氧化物作为氢渗透屏障
DOI:
10.1016/j.ijhydene.2019.03.086
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发表时间:
2019-05
影响因子:
7.2
通讯作者:
Zhang Zhengjun
中科院分区:
文献类型:
--
作者:
Zhang Mengyuan;Zhao Rongyi;Ling Yunhan;Wang Rongguang;Zhou Qingyun;Wang Jipeng;Li Yunhui;Zhang Zhengjun
Iron-nickel based stainless steel (SS) applied in nuclear plants as a substrate material barely suppresses the permeation of hydrogen plasmas, which are mainly composed of positive and negative hydrogen ions with trace amounts of non-ionized hydrogen atoms. In this work, a new Cr2O3/Al2O3bipolar oxide barrier was prepared using atomic layer deposition (ALD) of Al2O3on a Cr2O3layer that was generated by removing partial oxides with cyclic voltammetry (CV) of SS that had been pre-oxidized at 550 °C in air. We found that a small layer of α-Al2O3was formed by the template effect of Cr2O3at the interface of this composite film. The hydrogen permeation behavior of this bipolar oxide barrier in a fusion reactor was simulated with hydrogen-discharging plasma treatment. The results demonstrated that the hydrogen permeation resistance of this bipolar oxide was superior to the original oxide or a Cr2O3film. Impressively, hydrogen plasma treatment repaired the bipolar oxide via reduction of the defective CrO3, resulting in an improvement in the hydrogen permeation resistance. These findings demonstrate a novel method of hydrogen permeation barrier preparation on SS, providing insight into hydrogen barrier construction for future nuclear energy applications.
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DOI:
10.3724/sp.j.1095.2013.20385
发表时间:
2013-01
期刊:
Chinese Journal of Applied Chemistry
影响因子:
--
作者:
王丽品 王森林 段钱花;Wang Senlin Duan Qianhua Wang Lipin-Wang-Senlin-Duan-Qianhua-Wang-Lipin-114028374
通讯作者:
王丽品 王森林 段钱花;Wang Senlin Duan Qianhua Wang Lipin-Wang-Senlin-Duan-Qianhua-Wang-Lipin-114028374
DOI:
10.1021/la049590v
发表时间:
2004-07
期刊:
Langmuir : the ACS journal of surfaces and colloids
影响因子:
--
作者:
T. V. Malleswara Rao;G. Deo;J. Jehng;I. Wachs
通讯作者:
T. V. Malleswara Rao;G. Deo;J. Jehng;I. Wachs
影响因子:
1.7
作者:
DESIMONI, E;MALITESTA, C;RIVIERE, JC
通讯作者:
RIVIERE, JC
影响因子:
7.2
作者:
Wang Jipeng;Lu Zhaoxia;Ling Yunhan;Wang Rongguang;Li Yunhui;Zhou Qingyun;Zhang Zhengjun
通讯作者:
Zhang Zhengjun
影响因子:
--
作者:
SHUTTLEWORTH, D
通讯作者:
SHUTTLEWORTH, D