High-performance thin film transistors from semiconducting liquid crystalline phases by solution processes
High-performance thin film transistors from semiconducting liquid crystalline phases by solution processes
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通过溶液工艺从半导体液晶相制备高性能薄膜晶体管
DOI:
10.1063/1.2768307
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发表时间:
2007
影响因子:
4
通讯作者:
N. Tamaoki
中科院分区:
文献类型:
--
作者:
Fapei Zhang;M. Funahashi;N. Tamaoki
The authors have prepared liquid crystalline (LC) semiconducting thin films with smectic phases at room temperature from 5-propyl-5″-(4-pentylphenyl)-2,2′:5′,2″-terthiophene (3-TTPPh-5) by spin-coating process. The films consist of large-size (approximately several tens of micrometers) LC domains with a lamellar structure. The ordering of molecular packing within the smectic layer is enhanced after annealing. The performance of thin film transistors (TFTs) based on 3-TTPPh-5 is influenced largely by silane agent modification of the dielectric. The octyltrichlorosilane (OTS) treatment enhances performance and leads to a high hole mobility of more than 4×10−2cm2∕Vs in ambient air. It is attributed to the formation of highly ordered domains with the size comparable to channel length of the TFT as well as the favorable interaction between OTS and LC molecules.The authors have prepared liquid crystalline (LC) semiconducting thin films with smectic phases at room temperature from 5-propyl-5″-(4-pentylphenyl)-2,2′:5′,2″-terthiophene (3-TTPPh-5) by spin-coating process. The films consist of large-size (approximately several tens of micrometers) LC domains with a lamellar structure. The ordering of molecular packing within the smectic layer is enhanced after annealing. The performance of thin film transistors (TFTs) based on 3-TTPPh-5 is influenced largely by silane agent modification of the dielectric. The octyltrichlorosilane (OTS) treatment enhances performance and leads to a high hole mobility of more than 4×10−2cm2∕Vs in ambient air. It is attributed to the formation of highly ordered domains with the size comparable to channel length of the TFT as well as the favorable interaction between OTS and LC molecules.
影响因子:
29.4
作者:
Funahashi, Masahiro;Zhang, Fapei;Tamaoki, Nobuyuki
通讯作者:
Tamaoki, Nobuyuki