Laser Crystallization and Dopant Activation of a-Si:H Carrier-Selective Layer in TOPCon Si Solar Cells
Laser Crystallization and Dopant Activation of a-Si:H Carrier-Selective Layer in TOPCon Si Solar Cells
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TOPCon 硅太阳能电池中 a-Si:H 载流子选择层的激光结晶和掺杂剂激活
DOI:
10.1109/jphotov.2020.3006273
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发表时间:
2020
影响因子:
3
通讯作者:
Gupta, Mool C.
中科院分区:
文献类型:
--
作者:
Wilkes, George C.;Upadhyaya, Ajay D.;Rohatgi, Ajeet;Gupta, Mool C.
Herein, we present a pulsed-laser processing method for crystallization and dopant activation of a highly n-doped amorphous silicon (a-Si:H) carrier-selective layer in a tunnel oxide passivated contact (TOPCon) Si solar cell structure. The laser method provides enhanced conductivity and implied open circuit voltage while reducing emitter saturation current density and surface heating, as opposed to conventional high-temperature furnace annealing of the bulk Si wafer with a TOPCon structure. We identify an appropriate laser wavelength, fluence, and layer thickness using modeling and simulations. Raman and Hall effect measurements demonstrate increased crystallinity and dopant activation, whereas photoconductive decay shows enhanced surface and interface passivation quality. Additionally, we examine the role of subsequent SiNx deposition on further improving the passivation of laser-processed TOPCon layers to achieve a 5.9 kΩ/sq film sheet resistance, 2 ms effective carrier lifetime, 718 mV implied open-circuit voltage (iVOC), and 8.6 fA/cm2one-side recombination current density (J0) with the potential for further passivation improvement via laser process and a-Si layer thickness optimization.
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DOI:
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发表时间:
2019
期刊:
Photovoltaic Specialists Conference
影响因子:
--
作者:
George C. Wilkes;A. Upadhyaya;A. Rohatgi;M. Gupta
通讯作者:
M. Gupta