Effect of Nb content on the microstructure and corrosion resistance of the sputtered Cr-Nb-N coatings
Effect of Nb content on the microstructure and corrosion resistance of the sputtered Cr-Nb-N coatings
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Nb含量对溅射Cr-Nb-N涂层显微组织和耐蚀性的影响
DOI：
10.1016/j.jallcom.2018.01.034
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发表时间：
2018-04
影响因子：
6.2
通讯作者：
Lijun Weng
中科院分区：
文献类型：
--
作者：
Desheng Wang;Yanlong Fu;Ming Hu;Dong Jiang;Xiaoming Gao;Qinqin Wang;Jun Yang;Jiayi Sun;Lijun Weng
在Ar-N2混合气体中，用反应磁控溅射法在AISI440C衬底上制备了Nb含量为5.1~19.5at.%的Cr-Nb-N薄膜。研究了Nb含量对合金组织和在3.5wt%氯化钠溶液中腐蚀行为的影响。所有沉积的薄膜都具有典型的颗粒状结构的表面特征。Nb含量为5.1at.%和10.9at.%的Cr-Nb-N薄膜在薄膜-衬底界面附近呈现出由致密的共格层和柱状层组成的双层结构，柱状层与纯CrN的柱状结构不同。对于Nb含量较高的Cr-Nb-N薄膜，没有明显的致密层，而是柱状结构。与纯CrN涂层相比，低Nb含量的CrNb-N涂层样品的腐蚀电位和点蚀电位均有正移，而高Nb含量的CrNb-N涂层样品的点蚀电位降低。Nb含量为10.9at.%的Cr-Nb-N薄膜具有最好的耐蚀性，这是由于Nb掺杂改变了薄膜的微观结构而产生的高的极化电阻所致。
Thin Cr-Nb-N films with Nb content ranging from 5.1 to 19.5 at.% were prepared onto the AISI 440C substrates by reactive magnetron sputtering of the Cr and Nb in Ar-N2gas mixture. The effects of the Nb content on the microstructure and the corrosion behavior in 3.5 wt% NaCl solution were investigated. All the deposited films showed a typical surface feature of granular structure. The Cr-Nb-N films with 5.1 at.% and 10.9 at.% Nb showed a duplex layers consisting of a dense and coherent layer near film-substrate interface, followed by a columnar layer differed from the uniform columnar structure for pure CrN. While for Cr-Nb-N films with higher Nb content, there was no obvious dense layer but a columnar structure. The low Nb content Cr-Nb-N coated samples showed a positive shift of both corrosion potential and the pitting potential compared to the pure CrN coated sample while the pitting potential decreased for high Nb content Cr-Nb-N coated samples. The Cr-Nb-N film with Nb content of 10.9 at.% possesses the best corrosion resistance due to the high polarization resistance resulted from the modification of the microstructure by the Nb incorporation.
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影响因子：
4
作者：
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影响因子：
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