Direct laser writing of micrograting arrays using a spatial light modulator

Direct laser writing of micrograting arrays using a spatial light modulator
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使用空间光调制器直接激光写入微光栅阵列

DOI:
10.1117/12.2647393
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发表时间:
2023
期刊:
1243304 (15 March 2023
影响因子:
--
通讯作者:
McGee, David J.
McGee, David J.
中科院分区:
--
文献类型:
--
作者:
Strobelt, Jonas;Van Soelen, Matthew;McGee, David J.

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表面微光栅阵列的应用范围从衍射光学到生物工程表面。我们报告了一个通用的制造平台,这些阵列的基础上结构偏振光和光响应偶氮聚合物薄膜的无掩模光加工。使用被配置为偏振调制器的空间光调制器(SLM)对膜进行图案化。光源为488 nm激光器,曝光时间为5秒或更短。来自SLM的结构偏振光成像到薄膜上,写入120 µm x 80 µm的表面浮雕图案,其振幅和周期分别可在25 nm至1 µm和700 nm至10 µm范围内控制。这些图案通过XY平移缝合成更大的区域图案。通过各种微光栅图案,包括衍射光学元件,多路复用表面光栅阵列,和用于光学安全应用的衍射光学可变图像设备,证明了多功能性。在不同的应用中,可以利用聚合物膜的生物相容性,因为细胞与合成微尺度结构的相互作用影响广泛的细胞反应。我们证明了这一点,显示定向细胞生长介导的微光栅阵列。在所有示例中,表面光栅不需要曝光后处理,在环境条件下是稳定的,并且可以使用纳米压印光刻来复制。
Surface micrograting arrays have applications ranging from diffractive optics to bioengineered surfaces. We report a versatile fabrication platform for the maskless photofabrication of these arrays based on structured polarized light and photoresponsive azopolymer films. The films are patterned using a spatial light modulator (SLM) configured as a polarization modulator. The light source is a 488 nm laser with exposure times of order 5 sec or less. Structured polarized light from the SLM is imaged onto the film, writing a 120 µm x 80 µm surface relief pattern with amplitudes and periods controllable from 25 nm to 1 µm and 700 nm- 10 µm respectively. These are stitched into larger area patterns via XY translation. The versatility is demonstrated through a variety of micrograting patterns, including diffractive optical elements, multiplexed surface grating arrays, and diffractive optically variable image devices for optical security applications. In a different application, the biocompatibility of the polymeric film can be leveraged since cellular interaction with synthetic microscale structures influences a wide array of cell responses. We demonstrate this by showing directed cell growth mediated by the micrograting array. In all examples, the surface gratings required no post-exposure processing, are stable in ambient conditions, and can be replicated using nanoimprint lithography.
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