Cytosine deamination is a major cause of baseline noise in next-generation sequencing.
Cytosine deamination is a major cause of baseline noise in next-generation sequencing.
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DOI:
10.1007/s40291-014-0115-2
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发表时间:
2014-10
影响因子:
4
通讯作者:
Eshleman, James R.
中科院分区:
文献类型:
--
作者:
Chen, Guoli;Mosier, Stacy;Gocke, Christopher D.;Lin, Ming-Tseh;Eshleman, James R.
As next generation sequencing (NGS) becomes a major sequencing platform in clinical diagnostic laboratories, it is critical to identify artifacts that constitute baseline noise and may interfere with detection of low level gene mutations. This is especially critical for applications requiring ultrasensitive detection, such as molecular relapse of solid tumors and early detection of cancer. We recently observed approximately ~10-fold higher C:G > T:A mutations than other background noise in both wild type peripheral blood and formalin fixed paraffin embedded (FFPE) samples. We hypothesized that these might represent cytosine deamination events that have been seen using other platforms. To test the hypothesis, we pretreated samples with uracil N-glycosylase (UNG). Additionally, we also tested whether some of the cytosine deamination might be laboratory artifact by simulating the heat associated with PCR thermocyling by subjecting samples to thermocycling in the absence of polymerase. To test the safety of universal UNG pretreatment, we tested known positive samples treated with UNG. UNG pretreatment significantly reduced these mutations, consistent with a biologic source for the cytosine deamination. The simulated thermocycling heated samples demonstrated significantly increased C:G > T:A mutations without affecting other baseline base substitutions. Samples with known mutations demonstrated no decrease in our ability to detect these after treatment with UNG. Baseline noise during NGS is mostly due to cytosine deamination, the source of which is likely both biologic and an artifact of thermocycling, and it can be reduced by UNG pretreatment.
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影响因子:
17.1
作者:
Leary RJ;Kinde I;Diehl F;Schmidt K;Clouser C;Duncan C;Antipova A;Lee C;McKernan K;De La Vega FM;Kinzler KW;Vogelstein B;Diaz LA Jr;Velculescu VE
通讯作者:
Velculescu VE
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11.2
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Goggins, Michael
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Lin, Ming-Tseh;Tseng, Li-Hui;Gocke, Christopher D.
通讯作者:
Gocke, Christopher D.
影响因子:
4.8
作者:
Sandigursky, M;Franklin, WA
通讯作者:
Franklin, WA