Observations of orientation dependence of surface morphology in tungsten implanted by low energy and high flux D plasma
Observations of orientation dependence of surface morphology in tungsten implanted by low energy and high flux D plasma
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低能高通量D等离子体注入钨表面形貌取向依赖性的观察
DOI：
10.1016/j.jnucmat.2013.07.062
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发表时间：
2013-11
影响因子：
3.1
通讯作者：
X. Huang
中科院分区：
文献类型：
--
作者：
H.Y. Xu;Y.B. Zhang;Y. Yuan;B.Q. Fu;A. Godfrey;G. De Temmerman;刘伟;X. Huang
在暴露于具有1024m−2s−1的高通量的低能量（38 eV）氘（D）等离子体后，在轧制钨和再结晶钨的表面上观察到了通过形成具有明显取向依赖性的起泡和纳米结构的表面改性。在再结晶钨上检查气泡和具有晶粒取向的纳米结构之间的相关性，以排除在塑性变形期间引入的缺陷对表面改性图案的影响。起泡量从靠近取向的晶粒最多变为<1 1 1>靠近取向的晶粒最少<0 0 1>。观察到三种典型的纳米结构，具有明显的依赖于晶粒取向。三角形结构上观察到<1 1 1>的反极图的角落附近的晶粒取向，与层状结构形成的<0 1 1>晶粒附近的角落，和海绵状结构的晶粒附近的角落<0 0 1>。水泡和纳米结构的取向依赖性的可能原因进行了讨论。
Surface modification by formation of blistering and nanostructures with pronounced orientation dependence has been observed on surfaces of rolled tungsten and recrystallized tungsten after exposure to a low energy (38 eV) deuterium (D) plasma with a high flux of 1024m−2s−1. The correlation between blisters and nanostructures with grain orientation was examined on recrystallized tungsten to exclude the influence of defects introduced during plastic deformation on the pattern of surface modification. The amount of blistering changed from the most in grains oriented close to <1 1 1> to the least in grains oriented close to <0 0 1>. Three kinds of typical nanostructures were observed, with a clear dependence on grain orientation. Triangular structures were observed on grains oriented near the <1 1 1> corner of the inverse pole figure, with lamellar structures formed for grains oriented near the <0 1 1> corner, and spongy structures for grains near the <0 0 1> corner. Possible reasons for the orientation dependence of both the blisters and nanostructures are discussed.
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影响因子：
3.1
作者：
J. Condon;T. Schober
通讯作者：
J. Condon;T. Schober
影响因子：
2.9
作者：
S. Lindig;M. Balden;V. Alimov;T. Yamanishi;W. Shu;J. Roth
通讯作者：
S. Lindig;M. Balden;V. Alimov;T. Yamanishi;W. Shu;J. Roth
影响因子：
3.3
作者：
G. D. Temmerman;J. Zielinski;van S Diepen;Laurent Marot;M. Price
通讯作者：
G. D. Temmerman;J. Zielinski;van S Diepen;Laurent Marot;M. Price
影响因子：
3.1
作者：
M. Ye;H. Kanehara;S. Fukuta;N. Ohno;S. Takamura
通讯作者：
M. Ye;H. Kanehara;S. Fukuta;N. Ohno;S. Takamura
影响因子：
3.3
作者：
Shu, W. M.;Wakai, E.;Yamanishi, T.
通讯作者：
Yamanishi, T.