Low-Temperature Chemical Vapor Deposition of Anatase TiO2 with Titanium Tetraisopropooxide and H2O2 Vapor
Low-Temperature Chemical Vapor Deposition of Anatase TiO2 with Titanium Tetraisopropooxide and H2O2 Vapor
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四异丙醇钛和 H2O2 蒸气低温化学气相沉积锐钛矿型 TiO2
DOI：
10.1143/jjap.47.5619
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发表时间：
2008
影响因子：
1.5
通讯作者：
K. Kurita
中科院分区：
文献类型：
--
作者：
F. Hirose;Masashi Ito;K. Kurita
采用常压化学气相沉积法，以四异丙醇钛为前驱体，H_2O_2为氧化剂，在250 ℃下，以高于10 μ m/s的生长速率在Si（100）衬底上成功地沉积了多晶TiO_2薄膜。H2 O2蒸气增强了生长的薄膜中的TiO 2非晶网络的结晶。我们还表明，通过低温沉积与H2 O2蒸气获得的TiO 2膜表现出其表面上的自然吸附的碳杂质的光催化活性，表明本技术的光催化剂涂层领域的适用性。本技术也适用于在柔性聚酰亚胺带上沉积TiO 2薄膜。
Polycrystalline anatase TiO2 films have been successfully deposited on Si(100) substrates at a temperature of 250 °C at growth rates of higher than 10 Å/s by atmospheric chemical vapor deposition with titanium tetraisopropooxide as a precursor and H2O2 vapor as an oxidant. The H2O2 vapor enhances the crystallization of the TiO2 amorphous network in the grown films. We also show that TiO2 film obtained by low-temperature deposition with the H2O2 vapor exhibits a photocatalytic activity for the naturally adsorbed carbon impurity on its surface, indicating the applicability of the present technique to the field of photocatalyst coating. The present technique is also applicable to the deposition of anatase TiO2 films on flexible polyimide tapes.
影响因子：
4
作者：
HIGASHI, GS;CHABAL, YJ;RAGHAVACHARI, K
通讯作者：
RAGHAVACHARI, K