Staphylococcus aureus uses the ArlRS and MgrA cascade to regulate immune evasion during skin infection.
Staphylococcus aureus uses the ArlRS and MgrA cascade to regulate immune evasion during skin infection.
复制标题
DOI:
10.1016/j.celrep.2021.109462
复制
发表时间:
2021-07-27
期刊:
影响因子:
8.8
通讯作者:
Horswill AR
中科院分区:
文献类型:
--
作者:
Kwiecinski JM;Kratofil RM;Parlet CP;Surewaard BGJ;Kubes P;Horswill AR
Skin is one of the most common sites of host immune response against Staphylococcus aureus infection. Here, through a combination of in vitro assays, mouse models, and intravital imaging, we find that S. aureus immune evasion in skin is controlled by a cascade composed of the ArlRS two-component regulatory system and its downstream effector, MgrA. S. aureus lacking either ArlRS or MgrA is less virulent and unable to form correct abscess structure due to de-repression of a giant surface protein, Ebh. These S. aureus mutants also have decreased expression of immune evasion factors (leukocidins, chemotaxis-inhibitory protein of S. aureus [CHIPS], staphylococcal complement inhibitor [SCIN], and nuclease) and are unable to kill neutrophils, block their chemotaxis, degrade neutrophil extracellular traps, and survive direct neutrophil attack. The combination of disrupted abscess structure and reduced immune evasion factors makes S. aureus susceptible to host defenses. ArlRS and MgrA are therefore the main regulators of S. aureus immune evasion and promising treatment targets. Kwiecinski et al. show that Staphylococcus aureus uses the ArlRS-MgrA regulatory system to coordinate gene expression during skin infection. This cascade is required for proper abscess structuring and evasion of the host innate immune system, which together are essential for full S. aureus virulence.
登录
查看更多内容
影响因子:
6.7
作者:
Crosby HA;Schlievert PM;Merriman JA;King JM;Salgado-Pabón W;Horswill AR
通讯作者:
Horswill AR
影响因子:
5.7
作者:
Fraunholz M;Sinha B
通讯作者:
Sinha B
影响因子:
6.4
作者:
Harper L;Balasubramanian D;Ohneck EA;Sause WE;Chapman J;Mejia-Sosa B;Lhakhang T;Heguy A;Tsirigos A;Ueberheide B;Boyd JM;Lun DS;Torres VJ
通讯作者:
Torres VJ
影响因子:
6.4
作者:
Gupta, Ravi Kr;Alba, Jimena;Lee, Chia Y.
通讯作者:
Lee, Chia Y.
影响因子:
3.7
作者:
De Jong, Nienke W. M.;Van Kessel, Kok P. M.;Van Strijp, Jos A. G.
通讯作者:
Van Strijp, Jos A. G.