Controlled Activation of Substrate Templating in Molecular Self-Assembly by Deprotonation
Controlled Activation of Substrate Templating in Molecular Self-Assembly by Deprotonation
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通过去质子化控制分子自组装中底物模板的激活
DOI:
10.1021/jp408664n
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发表时间:
2013
影响因子:
3.7
通讯作者:
Angelika Kühnle
中科院分区:
文献类型:
--
作者:
Markus Kittelmann;Markus Nimmrich;Julia L. Neff;Philipp Rahe;Wojciech Gren;Xavier Bouju;André Gourdon;Angelika Kühnle
Templated assembly of organic molecules constitutes a promising approach for fabricating functional nanostructures at surfaces with molecular-scale control. Using the substrate template for steering the adsorbate growth enables creating a rich variety of molecular structures by tuning the subtle balance of intermolecular and molecule–surface interactions. On insulating surfaces, however, surface templating is largely absent due to the comparatively weak molecule–surface interactions compared to metallic substrates. Here, we demonstrate the activation of substrate templating in molecular self-assembly on a bulk insulator by controlled deprotonation of the adsorbed molecules upon annealing. Upon deposition of 4-iodobenzoic acid onto the natural cleavage plane of calcite held at room temperature, high molecular mobility is observed, indicating a small diffusion barrier. Molecular islands only nucleate at step edges. These islands show no commensurability with the underlying substrate, clearly indicating the absence of surface templating. Upon annealing the substrate, the molecules undergo a transition from the protonated to the deprotonated state. In the deprotonated state, the molecules adopt a well-defined adsorption position, resulting in a distinctly different, substrate-templated molecular structure that is stable at room temperature. Our work, thus, demonstrates the controlled activation of substrate templating by changing the molecule–surface interaction upon annealing.
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影响因子:
3.1
作者:
Glatzel T;Zimmerli L;Kawai S;Meyer E;Fendt LA;Diederich F
通讯作者:
Diederich F
影响因子:
17.1
作者:
Kittelmann, Markus;Rahe, Philipp;Kuehnle, Angelika
通讯作者:
Kuehnle, Angelika
影响因子:
17.1
作者:
Such, Bartosz;Trevethan, Thomas;Echavarren, Antonio M.
通讯作者:
Echavarren, Antonio M.
影响因子:
3.7
作者:
J. Schütte;R. Bechstein;M. Rohlfing;M. Reichling;A. Kühnle
通讯作者:
A. Kühnle
影响因子:
13.3
作者:
Philipp Rahe;Markus Nimmrich;Angelika Kühnle
通讯作者:
Angelika Kühnle