Memristive Devices Based on Two-Dimensional Transition Metal Chalcogenides for Neuromorphic Computing.
Memristive Devices Based on Two-Dimensional Transition Metal Chalcogenides for Neuromorphic Computing.
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DOI:
10.1007/s40820-021-00784-3
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发表时间:
2022-02-05
影响因子:
26.6
通讯作者:
Jang HW
中科院分区:
文献类型:
--
作者:
Kwon KC;Baek JH;Hong K;Kim SY;Jang HW
Based on the benefits of two-dimensional (2D) transition metal chalcogenides (TMC) materials, the operating concepts and basics of memristors for neuromorphic computing are introduced. The prospects of 2D TMC materials and heterostructures are reviewed, as well as the state-of-the-art demonstration of 2D TMCs-based memristors for neuromorphic computing applications. The most recent advances, current challenges, and future prospects for the manufacture and characterization of memristive neuromorphic devices based on 2D TMCs are discussed. Two-dimensional (2D) transition metal chalcogenides (TMC) and their heterostructures are appealing as building blocks in a wide range of electronic and optoelectronic devices, particularly futuristic memristive and synaptic devices for brain-inspired neuromorphic computing systems. The distinct properties such as high durability, electrical and optical tunability, clean surface, flexibility, and LEGO-staking capability enable simple fabrication with high integration density, energy-efficient operation, and high scalability. This review provides a thorough examination of high-performance memristors based on 2D TMCs for neuromorphic computing applications, including the promise of 2D TMC materials and heterostructures, as well as the state-of-the-art demonstration of memristive devices. The challenges and future prospects for the development of these emerging materials and devices are also discussed. The purpose of this review is to provide an outlook on the fabrication and characterization of neuromorphic memristors based on 2D TMCs.
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影响因子:
16.6
作者:
Boyn S;Grollier J;Lecerf G;Xu B;Locatelli N;Fusil S;Girod S;Carrétéro C;Garcia K;Xavier S;Tomas J;Bellaiche L;Bibes M;Barthélémy A;Saïghi S;Garcia V
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Garcia V
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16.6
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17.1
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通讯作者:
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影响因子:
4.3
作者:
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通讯作者:
Maass, Wolfgang
影响因子:
10.8
作者:
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通讯作者:
Hu, Yun Hang