The Ability of Silicon Fertilisation to Alleviate Salinity Stress in Rice is Critically Dependent on Cultivar.
The Ability of Silicon Fertilisation to Alleviate Salinity Stress in Rice is Critically Dependent on Cultivar.
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DOI：
10.1186/s12284-022-00555-7
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发表时间：
2022-02-02
期刊：
影响因子：
--
通讯作者：
Maathuis FJM
中科院分区：
文献类型：
--
作者：
Thorne SJ;Stirnberg PM;Hartley SE;Maathuis FJM
施用硅肥可以提高水稻的耐盐性。硅的吸收率及其相关的好处是众所周知的植物基因型之间的差异，但迄今为止，很少有研究已经做了如何的好处，因此，经济可行性，硅施肥品种之间的变化。在这项研究中，一系列的水稻品种都水培和土壤中生长，在不同水平的硅和NaCl，以确定品种的变化，硅的反应。硅对盐胁迫的影响存在显著差异，有些品种硅能缓解盐胁迫对生长的抑制，有些品种则不受影响，甚至受到负面影响。因此，当评估硅补充在缓解盐胁迫的好处，它是必不可少的收集品种的具体数据，包括产量，因为生物量的变化并不总是相关的产量。研究发现，在保护水稻免受盐胁迫方面，根部硅含量比地上部硅更重要，根部硅含量为0.5-0.9%时，硅对胁迫的缓解作用最大。成本效益分析表明，硅肥是有益的，在温和的压力，高产条件下，但不符合成本效益的低产生产系统。在线版本包含补充材料，可通过10.1186/s12284-022-00555-7获得。
Silicon (Si) fertiliser can improve rice (Oryza sativa) tolerance to salinity. The rate of Si uptake and its associated benefits are known to differ between plant genotypes, but, to date, little research has been done on how the benefits, and hence the economic feasibility, of Si fertilisation varies between cultivars. In this study, a range of rice cultivars was grown both hydroponically and in soil, at different levels of Si and NaCl, to determine cultivar variation in the response to Si. There was significant variation in the effect of Si, such that Si alleviated salt-induced growth inhibition in some cultivars, while others were unaffected, or even negatively impacted. Thus, when assessing the benefits of Si supplementation in alleviating salt stress, it is essential to collect cultivar-specific data, including yield, since changes in biomass were not always correlated with those seen for yield. Root Si content was found to be more important than shoot Si in protecting rice against salinity stress, with a root Si level of 0.5–0.9% determined as having maximum stress alleviation by Si. A cost–benefit analysis indicated that Si fertilisation is beneficial in mild stress, high-yield conditions but is not cost-effective in low-yield production systems. The online version contains supplementary material available at 10.1186/s12284-022-00555-7.
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